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A silicon block crushing device and its use method, a silicon block crushing method and its application method

A technology of crushing device and application method, which is applied in the direction of grain processing, etc., can solve the problems of silicon block surface pollution, silicon block metal pollution, affecting the quality of downstream single crystal products, etc., and achieve the effect of eliminating half-fracture phenomenon

Active Publication Date: 2021-10-08
江苏鑫华半导体科技股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Traditional crushing methods generally use tungsten alloy hammers for manual crushing, or use roller crushers for mechanical crushing, but the former is manually operated, which is easy to introduce artificial pollution during the operation, and the latter will cause excessive silicon block and mechanical equipment. More contact, the surface of the silicon block is polluted by a large amount of metals; both of the above situations will lead to surface contamination of the silicon block, thereby affecting the quality of downstream single crystal products

Method used

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  • A silicon block crushing device and its use method, a silicon block crushing method and its application method
  • A silicon block crushing device and its use method, a silicon block crushing method and its application method
  • A silicon block crushing device and its use method, a silicon block crushing method and its application method

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preparation example Construction

[0057] The value range of the above-mentioned resistivity ρ is easier to meet in the preparation of high-purity water, and the silicon block crushing device provided in the present invention can effectively avoid the pollution introduced by people or metal materials during the manual or mechanical crushing process. As far as the whole device is concerned, the two pulse electrodes 2 can be adjusted in various ways, and the wire 4 connected to the pulse electrode 2 or other related structures can be fixed through the fixing structure 5, so as to realize the suspension of the pulse electrode 2; Wherein, taking the fixing of the wire 4 as an example, the connection of the wire 4 and the fixed structure 5 and the adjustment of the length of the wire 4 relative to the fixed structure 5 are relatively easy to realize, and the adjustment of the suspension height can be quickly realized through the above adjustment. In order to realize the position adjustment of the two pulse electrodes...

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Abstract

The present invention relates to the technical field of crushing devices, in particular to a silicon block crushing device, comprising: a container, which provides a storage space for silicon rods to be crushed, and performs a crushing action in the storage space; two pulse electrodes, suspended in the storage space, And the suspension height and the position of the two pulse electrodes in the horizontal plane can be adjusted; there is high-purity water in the container, and the pulse electrodes generate pulse arcs in the high-purity water. The resistivity of high-purity water is ρ, and the unit is MΩ.cm, 16MΩ.cm≤ρ≤ 20MΩ.cm. In the present invention, during the pulse crushing process, the medium in contact with the silicon rod is high-purity water, which avoids the pollution introduced by people or metal materials during the manual or mechanical crushing process, forms a pulsed arc at the electrode, and the arc enters the interior of the polysilicon to form a plasma arc Channels, and finally break the silicon rods into silicon blocks of different sizes. The invention also claims the use method of the silicon block crushing device, as well as a silicon block crushing method and application method.

Description

technical field [0001] The present invention relates to the technical field of crushing devices, in particular to a silicon block crushing device and its use method, a silicon block crushing method and its application method. Background technique [0002] Electronic-grade polysilicon is the basic raw material of the integrated circuit industry. It is generally produced by the improved Siemens method. Polysilicon rods are produced by chemical vapor deposition in a reduction furnace, and then crushed, screened and cleaned to obtain polysilicon of different sizes. block, so that downstream semiconductor silicon wafer manufacturers put into furnaces for single crystal pulling. [0003] Traditional crushing methods generally use tungsten alloy hammers for manual crushing, or use roller crushers for mechanical crushing, but the former is manually operated, which is easy to introduce artificial pollution during the operation, and the latter will cause excessive silicon block and me...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B02C19/18
CPCB02C19/18
Inventor 吴锋田新王付刚徐玲锋陈卓
Owner 江苏鑫华半导体科技股份有限公司
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