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Silicon block crushing device, using method, silicon block crushing method and application method

A technology of a crushing device and a crushing method, which is applied in grain processing and other directions, can solve the problems of surface contamination of silicon blocks, affecting the quality of downstream single crystal products, and metal contamination of silicon blocks, and achieve the effect of eliminating the phenomenon of semi-fracture.

Active Publication Date: 2021-08-27
江苏鑫华半导体科技股份有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Traditional crushing methods generally use tungsten alloy hammers for manual crushing, or use roller crushers for mechanical crushing, but the former is manually operated, which is easy to introduce artificial pollution during the operation, and the latter will cause excessive silicon block and mechanical equipment. More contact, the surface of the silicon block is polluted by a large amount of metals; both of the above situations will lead to surface contamination of the silicon block, thereby affecting the quality of downstream single crystal products

Method used

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  • Silicon block crushing device, using method, silicon block crushing method and application method
  • Silicon block crushing device, using method, silicon block crushing method and application method
  • Silicon block crushing device, using method, silicon block crushing method and application method

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[0057] The value range of the above-mentioned resistivity ρ is easier to meet in the preparation of high-purity water, and the silicon block crushing device provided in the present invention can effectively avoid the pollution introduced by people or metal materials during the manual or mechanical crushing process. As far as the whole device is concerned, the two pulse electrodes 2 can be adjusted in various ways, and the wire 4 connected to the pulse electrode 2 or other related structures can be fixed through the fixing structure 5, so as to realize the suspension of the pulse electrode 2; Wherein, taking the fixing of the wire 4 as an example, the connection of the wire 4 and the fixed structure 5 and the adjustment of the length of the wire 4 relative to the fixed structure 5 are relatively easy to realize, and the adjustment of the suspension height can be quickly realized through the above adjustment. In order to realize the position adjustment of the two pulse electrodes...

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Abstract

The invention relates to the technical field of crushing devices, in particular to a silicon block crushing device which comprises: a container for providing a containing space for a silicon rod to be crushed and executing crushing action in the containing space; two pulse electrodes which are hung in the containing space, wherein the hanging height and the positions of the two pulse electrodes in the horizontal plane can be adjusted; high-purity water is arranged in the container, the pulse electrodes generate a pulse arc in the high-purity water, the resistivity of the high-purity water is rho, the unit is M omega.cm, and rho is more than or equal to 16 M omega.cm and less than or equal to 20 M omega.cm. According to the invention, in the pulse crushing process, the medium contacted with the silicon rod is high-purity water, so that pollution caused by human or metal materials in the manual or mechanical crushing process is avoided, the pulse arc is formed at an electrode, the arc enters the polycrystalline silicon to form a plasma arc channel, and finally, the silicon rod is crushed into silicon blocks with different sizes. The invention further provides a using method of the silicon block crushing device, a silicon block crushing method and an application method.

Description

technical field [0001] The present invention relates to the technical field of crushing devices, in particular to a silicon block crushing device and its use method, a silicon block crushing method and its application method. Background technique [0002] Electronic-grade polysilicon is the basic raw material of the integrated circuit industry. It is generally produced by the improved Siemens method. Polysilicon rods are produced by chemical vapor deposition in a reduction furnace, and then crushed, screened and cleaned to obtain polysilicon of different sizes. block, so that downstream semiconductor silicon wafer manufacturers put into furnaces for single crystal pulling. [0003] Traditional crushing methods generally use tungsten alloy hammers for manual crushing, or use roller crushers for mechanical crushing, but the former is manually operated, which is easy to introduce artificial pollution during the operation, and the latter will cause excessive silicon block and me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B02C19/18
CPCB02C19/18
Inventor 吴锋田新王付刚徐玲锋陈卓
Owner 江苏鑫华半导体科技股份有限公司
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