Dust detection cleaning device

Abstract

The invention discloses a dust detection cleaning device. The device is provided with a machine, a detection device and a cleaning device are arranged on the machine in parallel; and a module transmission device is arranged between the detection device and the cleaning device; the detection device comprises a module transferring mechanism, a module moving mechanism, a location detection module, adust detection mechanism and a module bearing mechanism; the module transferring mechanism and the module bearing mechanism are arranged in parallel; the dust detection mechanism is arranged at one side of the module bearing mechanism; the module moving mechanism is vertically arranged above the module transferring module and the module bearing mechanism; the location detection module is arrangedon the module moving mechanism; the cleaning device comprises a dust removing device, the dust removing device and the module moving mechanism are arranged in parallel; the detection device, the cleaning device and the module transmission device are controlled through a central control device. The cleaning device disclosed by the invention has the advantages of being full-automatic in online dry cleaning and targeted fixed-point cleaning, low in water consumption, low in pollution and low in production cost.

Description

technical field [0001] The invention relates to a cleaning device, in particular to a dust detection and cleaning device. Background technique [0002] With the development of high-tech products, the cleanliness of components in the production process of high-precision products is getting higher and higher, such as the assembly of optical filters and photosensitive chips of camera modules, and the preparation of semiconductor products. There is no cleaning inspection and cleaning of the relevant parts, and the direct use of the preparation causes the fine particles and dust attached to the surface of the parts to directly affect the quality and use effect of the product. However, with the development of technology, the requirements for process technology are getting higher and higher. For example, the requirements for the surface quality of semiconductor chips and optical components are becoming more and more stringent. The main reason is that the dust particles and impuriti...

AI Technical Summary

Problems solved by technology

Domestic silicon wafer cleaning mostly adopts the cleaning process mainly based on wet chemical cleaning. Due to the relatively backward equipment and process methods, especially the ultra-clean environment often cannot reach the corresponding level, so it cannot reach the out-of-the-box standard

[0004] Although the off-line silicon wafer cleaning technology has been greatly developed at present, the pollution problem caused by the cleaning equipment itself has not been completely solved, which has become an important factor affecting the yield

Images