Digital Moire phase shift interferometry method based on two-step carrier splicing method
A technology of phase-shifting interferometry and measurement method, which is applied in the field of photoelectric detection, can solve problems such as limited bandwidth, achieve the effects of improving measurement accuracy, eliminating the limitation of residual wavefront bandwidth, and expanding the measurement range
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0053] The surface shape error under rotationally symmetric wavefront is solved by digital Moiré phase-shifting interferometry method based on two-step carrier splicing method.
[0054] What is measured in this embodiment is a large residual wavefront with a PV of 84.4λ, and the distribution of the true value of the measured surface shape error is the same as figure 2 Same, PV value is 1.04λ. The maximum wavefront slope of the residual wavefront is already close to the Nyquist sampling frequency. In Example 1, the residual wavefront is used because the actual interferogram fringes are too dense to see more information with the naked eye, so the residual wavefront is used to represent , the actual calculation uses the interferogram for calculation.
[0055] The flow chart of the digital moiré phase-shifting interferometry method based on the two-step carrier splicing method disclosed in this embodiment is as follows Figure 4 As shown, the specific steps are as follows:
[...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com