Novel flower cultivation substrate

A technology for cultivation substrates and flowers, applied in planting substrates, culture media, applications, etc., can solve problems such as crop rot, deterioration, decay, and death, and achieve the effects of loose and breathable substrates, stable structures, and guaranteed water supply

Inactive Publication Date: 2018-08-21
陈思奇
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Many soilless cultivation substrates use nutrient-rich raw materials, which are different from the slow release or oxidation of soil cultivation when placed in a conventional environment, and are prone to deterioration and decay quickly, resulting in root rot of the cultivated crops, sickness, death

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] The present invention can be realized through some following embodiments:

[0012] A new type of flower cultivation substrate, which includes the following components: expanded perlite, glycerin, water retention agent, aloe vera gel, dextrin, chitosan, sawdust, and tobacco waste.

[0013] Preferably, the matrix includes the following components in parts by mass: 10-20 parts of expanded perlite, 1-2.5 parts of glycerol, 0.5-1.5 parts of water-retaining agent, 5-8 parts of aloe vera gel, and 1.5 parts of dextrin ~4.5 parts, chitosan 1~2 parts, sawdust 10~25 parts, tobacco waste 0.5~0.7 parts.

[0014] In addition, it is preferred that: the base also includes 5 to 15 parts of distilled water.

[0015] It is further preferred that: the matrix includes the following components in parts by mass: 10-20 parts of expanded perlite, 1-2.5 parts of glycerol, 0.5-1.5 parts of water-retaining agent, 5-8 parts of aloe vera gel, dextrin 1.5~4.5 parts, 1~2 parts chitosan, 10~25 parts ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a novel flower cultivation substrate. The novel flower cultivation substrate comprises the following components: expanded perlite, glycerin, a water-retaining agent, aloe gel,dextrin, chitosan, wood chips and tobacco waste. The novel flower cultivation substrate prepared by the invention is loose and breathable, rich in nutrients, slow in release, can maintain stable and sufficient water supply for a long time, and has bactericidal, bacteriostatic and disinfecting effects.

Description

technical field [0001] The invention relates to the technical field of flower cultivation. Background technique [0002] Many soilless cultivation substrates use nutrient-rich raw materials, which are different from the slow release or oxidation of soil cultivation when placed in a conventional environment, and are prone to deterioration and decay quickly, resulting in root rot of the cultivated crops, sickness, death. Contents of the invention [0003] The object of the present invention is to provide a cultivation substrate that does not require a strict aseptic environment, can be placed in a conventional environment, can effectively prevent diseased and dead flowers to be cultivated, and can ensure long-term stable water supply. [0004] Technical scheme of the present invention is as follows: [0005] A new type of flower cultivation substrate, which includes the following components: expanded perlite, glycerin, water retention agent, aloe vera gel, dextrin, chitosa...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C05G3/00A01G24/15A01G24/30A01G24/22
CPCC05G3/00A01G24/15A01G24/22A01G24/30C05D9/00C05F5/002C05F11/00
Inventor 陈思奇
Owner 陈思奇
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap