Photoresist composition and color filter

A color filter and composition technology, which is applied in the field of photoresist composition and color filter, can solve the problems of poor display effect of liquid crystal display, decreased developing ability of photosensitive resin, and poor light transmittance, etc. The effects of reduced oxygen functional groups, reduced influence, and improved heat resistance

Active Publication Date: 2018-06-22
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the latter improves the thermal stability of the photosensitive resin system, as the amount of epoxy resin added increases, the developing ability of the photosensitive resin decreases, and the light transmittance becomes poor, which in turn leads to the display effect of th

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photoresist composition and color filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0012] The invention provides a photoresist composition, wherein the photoresist composition includes a resin matrix, and the resin matrix includes an acrylic resin and a phosphoric acid group-modified epoxy acrylic resin. In this embodiment, the resin matrix includes acrylic resin and phosphoric acid group-modified epoxy acrylic resin. Since the acrylic resin has a better developing effect, and the phosphoric acid group is attached to the main chain of the epoxy resin, the ep...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses photoresist composition and a color filter. The photoresist composition is prepared from a resin matrix which contains acrylic resin and epoxy acrylic resin modified with phosphoric acid groups. By means of the technical scheme, the photoresist composition can have better developing performance and thermal stability.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a photoresist composition and a color filter. Background technique [0002] In the manufacturing process of TFT-LCD, the main components of the photoresist for the medium color filter include the pigment or dye and the photocuring system for dyeing. The main component of the photocuring system is photosensitive resin, that is, a type of resin that can be cured and crosslinked under UV light irradiation. The function of the resin is to disperse the pigment and realize the development. In addition, the thermal stability of the resin directly affects the effect of subsequent processes and product quality. [0003] In the prior art, in order to make the photoresist have better developability and thermal stability, methods of increasing the molecular weight of certain components in the photosensitive resin or adding epoxy resin to the photosensitive resin system are u...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/004G02B5/22G02F1/1335
CPCG02B5/223G02F1/133516G03F7/004
Inventor 李颖
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap