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Evaporation source device

An evaporation source and evaporation technology, which is used in vacuum evaporation plating, ion implantation plating, metal material coating processes, etc., and can solve the problems of controlling the coating rate and doping ratio.

Inactive Publication Date: 2018-02-13
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The rotation of the evaporation source shielding plate 15 is mainly controlled by the cylinder, so that the existing evaporation source has only two states of on and off, so it is difficult to control the coating rate and doping ratio in the coating process

Method used

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Embodiment Construction

[0028] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the present invention can be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar units are denoted by the same reference numerals.

[0029] The evaporation source device of this embodiment is used to perform evaporation operations on the substrate, such as figure 2 As shown, the evaporation source device includes: two evaporation sources 21 , 22 arranged in the evaporation chamber, two evaporation source shielding plates 24 and a driving component 25 .

[0030] Wherein the evaporation sources 21...

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Abstract

The invention provides an evaporation source device. The evaporation source device comprises an evaporation source, an evaporation source baffle and a driving part, wherein the evaporation source is arranged below a base plate; the evaporation source baffle is arranged between the evaporation source and the base plate; and the driving part is electrically connected with the evaporation source baffle, the driving part is used for driving the evaporative source baffle to rotate relative to the evaporation source , and the rotational rate of the evaporation source baffle in the film-coating process is controlled to adjust the evaporation rate of the evaporating source. The evaporation source device can control the coating rate of the evaporation source in the film-coating process.

Description

【Technical field】 [0001] The invention relates to the field of display technology, in particular to an evaporation source device. 【Background technique】 [0002] Compared with the current mainstream liquid crystal display technology, OLED display technology has the advantages of high contrast, wide color gamut, flexibility, thinness, and energy saving. Widespread in fields such as television and white light lighting. [0003] OLED technology mainly includes small molecule OLED technology based on vacuum evaporation technology and polymer OLED technology based on solution process. The evaporation machine is the main equipment for the production of small molecule OLED devices that have been mass-produced at present. The core part of the equipment is the evaporation source device, which is divided into point evaporation source, line evaporation source and surface evaporation source. The line evaporation source is currently an important OLED mass production technology, which i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54
Inventor 沐俊应李相烨李先杰
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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