A kind of ultra-smooth plane polishing device and polishing method based on magnetorheological glue
A polishing device and magnetorheological technology, applied in the field of ultra-precision machining, can solve the problems of easy sedimentation of polishing liquid, limited polishing shearing force, polishing efficiency and polishing quality that cannot meet production needs, etc., so as to ensure polishing efficiency and polishing quality. , The effect of preventing sedimentation and enrichment and improving service life
Active Publication Date: 2019-09-10
BEIJING JIAOTONG UNIV
View PDF6 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0005] The object of the present invention is to provide a kind of polishing device and polishing method based on magnetorheological glue that can improve material removal rate and improve polishing efficiency and quality, so as to solve the problems of easy sedimentation of polishing liquid and polishing shear force in the above-mentioned background technology. Limited, polishing efficiency and polishing quality can not meet the technical problems of production needs
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or modules having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.
[0030] Those skilled in the art will understand that unless otherwise stated, the singular forms "a", "an", "said" and "the" used herein may also include plural forms. It should be further understood that the word "comprising" used in the description of the present invention refers to the presence of said features, integers, steps, operations, elements and / or modules, but does not exclude the presence or addition of one or more other features, Integers, steps, operations, elements, modules, and / or groups thereof.
[0031] Those skilled in t...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM
Login to view more Abstract
The embodiment of the invention provides an ultra-smooth plane polishing device based on magnetorheological gel, and relates to the technical field of ultra-precision machining. The ultra-smooth plane polishing device comprises a bracket, wherein a platform is arranged at the top end of the bracket; a rotating seat is fixed on the platform; a polishing disc is arranged on the rotating seat; a polishing disc driving mechanism is connected with the rotating seat; a workpiece clamping mechanism is arranged above the polishing disc and comprises a clamping disc; a magnetic field generation mechanism is arranged below the platform and comprises a rotating disc; and a plurality of permanent magnets are uniformly arranged on the rotating disc. An ultra-smooth plane polishing method comprises the following steps: fixing a workpiece on the clamping disc of a polishing head; adding the magnetorheological gel into the polishing disc; and controlling the form of the magnetorheological gel through a dynamic magnetic field, so that the flexible polishing head can be formed and the workpiece can be polished. As the form of the magnetorheological gel is controlled through the dynamic magnetic field, the ultra-smooth plane polishing device can be simplified, the polishing efficiency can be improved, and the cost can be reduced. The ultra-smooth plane polishing device and method are very applicable to the polishing of ultra-smooth plane parts.
Description
technical field [0001] The invention relates to the technical field of ultra-precision processing, in particular to an ultra-smooth surface polishing device and method based on magnetorheological glue, which is particularly suitable for ultra-smooth surface processing of microelectronic semiconductor wafers. Background technique [0002] With the development of optics and microelectronics and related technical fields, the surface quality requirements of the required materials are getting higher and higher. At this stage, the surface polishing of ultra-precision workpieces is mainly carried out by chemical mechanical polishing and magnetorheological polishing. However, after using chemical mechanical polishing, it will be difficult to clean the surface material of the workpiece, which will easily pollute the environment and cannot meet the surface cleanliness and environmental protection requirements of super precision workpieces. [0003] Magnetorheological polishing technol...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Application Information
Patent Timeline
Login to view more Patent Type & Authority Patents(China)
IPC IPC(8): B24B1/00
Inventor 李建勇徐金环朱朋哲曹建国聂蒙
Owner BEIJING JIAOTONG UNIV
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Try Eureka
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap