A system and method for increasing the ratio of hydrogen molecular ions in an ECR ion source

A technology of ion ratio and ion source, applied in the field of ion source, can solve the problems of improving ECR ion source comparison system and other methods

Inactive Publication Date: 2018-10-16
PEKING UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But at present, there is no information on improving the H in the ECR ion source 2 + A systematic approach to the comparison of ion ratios

Method used

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  • A system and method for increasing the ratio of hydrogen molecular ions in an ECR ion source
  • A system and method for increasing the ratio of hydrogen molecular ions in an ECR ion source

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Embodiment Construction

[0037] The present invention will be further elaborated below through specific embodiments in conjunction with the accompanying drawings.

[0038] Such as figure 1 As shown, the electron cyclotron resonance ion source system for increasing the ratio of hydrogen molecular ions in this embodiment includes: a microwave system 1, an air inlet 2, a microwave window 3, a discharge chamber 4, a magnet 5, a discharge chamber lining 6, and a plasma electrode 7. Beam extraction system 8 and water-cooled circulation components; wherein, the interior of the discharge chamber 1 is a vacuum-sealed cylindrical cavity; water-cooled circulation components are arranged on the side walls of the discharge chamber; microwave windows are provided at the front end of the discharge chamber 3. The microwave system 1 is connected to the discharge chamber 4 through the microwave window 3; a magnet 5 is arranged on the outer wall of the discharge chamber 4; an air inlet 2 is arranged on the side wall of ...

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Abstract

The invention discloses a system used for improving the hydrogen molecule ion ratio in an ECR ion source and a method thereof. According to the invention, a discharge chamber lining is sleeved in a discharge chamber; the discharge chamber lining is made of a high composite coefficient material, wherein a tantalum material is used as lining for the first time in the ion source of the type to improve the H2+ ion ratio; pure hydrogen comes into the discharge chamber through an air inlet; a microwave system transmits microwave into the discharge chamber through a microwave window; a magnet provides an axial resonance field; the microwave reacts with the hydrogen in the discharge chamber to produce a plasma, and at the same time hydrogen atoms carry out recombination action on the surface of the high composite coefficient material of the discharge chamber lining to produce a lot of hydrogen molecules; the hydrogen molecule content in the discharge chamber is increased; the hydrogen atom content in the plasma is reduced; the H+ ratio is decreased; the H2+ ion ratio is increased; the H2+ ion current intensity can reach 40mA; the H2+ ion ratio can reach 50%; and the system has the advantages of high operation stability and long service life.

Description

technical field [0001] The invention relates to an ion source, in particular to a system and a method for increasing the ratio of hydrogen molecular ions in an electron cyclotron resonance ion source. Background technique [0002] An ion source is a device that ionizes neutral atoms or molecules and extracts an ion beam. It is widely used in accelerators, high-energy physics, ion implanters, semiconductors, and cancer treatment. According to the discharge mechanism, ion sources are divided into many types, such as Penning source, high-frequency ion source, laser ion source and so on. The electron cyclotron resonance ion source is a device that uses the electron cyclotron resonance (ECR) mechanism to generate ion beams. Electrons can be accelerated by resonant ionization of the gas to create a plasma. Since the ECR ion source is a non-cathode ion source, its life can be very long and its operation is stable, so it is adopted by many accelerator devices. [0003] According ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J49/10H01J49/14
CPCH01J49/10H01J49/147
Inventor 彭士香徐源任海涛张艾霖张滔张景丰温佳美武文斌
Owner PEKING UNIV
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