System used for improving hydrogen molecule ion ratio in ECR ion source and method thereof

A technology of ion ratio and ion source, applied in the field of ion source, can solve the problem of improving ECR ion source comparison system, etc.

Inactive Publication Date: 2017-09-22
PEKING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But at present, there is no information on improving the H in the ECR ion source 2 + A systematic approach to the comparison of ion ratios

Method used

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  • System used for improving hydrogen molecule ion ratio in ECR ion source and method thereof
  • System used for improving hydrogen molecule ion ratio in ECR ion source and method thereof

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Embodiment Construction

[0037] The present invention will be further elaborated below through specific embodiments in conjunction with the accompanying drawings.

[0038] Such as figure 1 As shown, the electron cyclotron resonance ion source system for increasing the ratio of hydrogen molecular ions in this embodiment includes: a microwave system 1, an air inlet 2, a microwave window 3, a discharge chamber 4, a magnet 5, a discharge chamber lining 6, and a plasma electrode 7. Beam extraction system 8 and water-cooled circulation components; wherein, the interior of the discharge chamber 1 is a vacuum-sealed cylindrical cavity; water-cooled circulation components are arranged on the side walls of the discharge chamber; microwave windows are provided at the front end of the discharge chamber 3. The microwave system 1 is connected to the discharge chamber 4 through the microwave window 3; a magnet 5 is arranged on the outer wall of the discharge chamber 4; an air inlet 2 is arranged on the side wall of ...

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Abstract

The invention discloses a system used for improving the hydrogen molecule ion ratio in an ECR ion source and a method thereof. According to the invention, a discharge chamber lining is sleeved in a discharge chamber; the discharge chamber lining is made of a high composite coefficient material, wherein a tantalum material is used as lining for the first time in the ion source of the type to improve the H2+ ion ratio; pure hydrogen comes into the discharge chamber through an air inlet; a microwave system transmits microwave into the discharge chamber through a microwave window; a magnet provides an axial resonance field; the microwave reacts with the hydrogen in the discharge chamber to produce a plasma, and at the same time hydrogen atoms carry out recombination action on the surface of the high composite coefficient material of the discharge chamber lining to produce a lot of hydrogen molecules; the hydrogen molecule content in the discharge chamber is increased; the hydrogen atom content in the plasma is reduced; the H+ ratio is decreased; the H2+ ion ratio is increased; the H2+ ion current intensity can reach 40mA; the H2+ ion ratio can reach 50%; and the system has the advantages of high operation stability and long service life.

Description

technical field [0001] The invention relates to an ion source, in particular to a system and a method for increasing the ratio of hydrogen molecular ions in an electron cyclotron resonance ion source. Background technique [0002] An ion source is a device that ionizes neutral atoms or molecules and extracts an ion beam. It is widely used in accelerators, high-energy physics, ion implanters, semiconductors, and cancer treatment. According to the discharge mechanism, ion sources are divided into many types, such as Penning source, high-frequency ion source, laser ion source and so on. The electron cyclotron resonance ion source is a device that uses the electron cyclotron resonance (ECR) mechanism to generate ion beams. Electrons can be accelerated by resonant ionization of the gas to create a plasma. Since the ECR ion source is a non-cathode ion source, its life can be very long and its operation is stable, so it is adopted by many accelerator devices. [0003] According ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/10H01J49/14
CPCH01J49/10H01J49/147
Inventor 彭士香徐源任海涛张艾霖张滔张景丰温佳美武文斌
Owner PEKING UNIV
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