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Acne-removing beauty mask formula

A facial mask and formula technology, which is applied in the direction of pharmaceutical formula, cosmetic preparations, dressing preparations, etc., can solve the problems of single effect of acne mask and difficult to eliminate scars, and achieve the effect of smooth skin and rapid repair of acne marks

Inactive Publication Date: 2017-06-30
HAIAN SHANGHAI JIAOTONG UNIV INTELLIGENT EQUIP RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Ordinary acne masks have a single effect, leaving acne marks and scars in the process of removing acne, making it difficult to remove the scars on the face

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0010] One of the preferred formulas of the acne-removing beauty mask formula is: 8% white poria, 7% bletilla striata, 10% skullcap, 15% aloe vera, 10% licorice, 10% glycerin, 7% ginseng, 15% pearl powder, and 8% angelica , Chrysanthemum 10%.

Embodiment 2

[0012] One of the preferred formulas of the acne-removing beauty mask formula is: 5% white poria, 10% bletilla striata, 8% skullcap, 15% aloe vera, 10% licorice, 10% glycerin, 5% ginseng, 15% pearl powder, and 10% angelica , Chrysanthemum 12%.

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PUM

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Abstract

The invention relates to an acne-removing beauty mask formula, wherein the weight ratio of all the components is as follows: 5 to 10 percent of poria cocos, 5 to 10 percent of bletilla root, 8 to 12 percent of baical skullcap root, 15 to 20 percent of aloe, 10 to 15 percent of liquorice root, 10 to 15 percent of glycerol, 5 to 10 percent of ginseng, 10 to 20 percent of pearl powder, 5 to 10 percent of china angelica and 8 to 12 percent of chrysanthemum flower. The formula can effectively remove acnes, and can quickly repair acne marks, so that skin is more smooth.

Description

technical field [0001] The invention relates to a formula, in particular to a formula of an acne-removing beauty mask. Background technique [0002] Ordinary acne-removing facial masks have a single effect, and will leave acne marks and scars during the acne-removing process, making it difficult to eliminate the scars on the face. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a formula for removing acne and beautifying facial mask, which can remove acne and improve beauty without leaving acne marks. [0004] In order to solve the problems of the technologies described above, the technical solution of the present invention is: [0005] A facial mask formula for removing acne, wherein the weight proportion of each component is: 5-10% of white poria, 5-10% of bletilla striata, 8-12% of scutellaria baicalensis, 15-20% of aloe vera, 10-15% of licorice, glycerin 10-15%, ginseng 5-10%, pearl powder 10-20%, angelica ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/9794A61K8/9728A61K8/98A61Q19/00A61Q19/02A61P17/10
CPCA61K8/987A61K8/97A61Q19/00A61Q19/02
Inventor 杨立拥
Owner HAIAN SHANGHAI JIAOTONG UNIV INTELLIGENT EQUIP RES INST
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