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Ferric chloride ito etching solution preparation system

A technology of ferric chloride and etching solution, which is applied in the direction of surface etching compositions, chemical instruments and methods, etc., can solve the problems of low degree of automation, poor material mixing effect, and insufficient product preparation accuracy, and achieve mixing The effect is good and the effect of ensuring product accuracy

Active Publication Date: 2018-05-11
ZHEJIANG SHINING ELECTRONICS MATERIALS CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In existing FeCl 3 In the preparation process of ITO etching solution, it is generally operated manually, the degree of automation is low, the mixing effect of materials is poor, and the precision of product preparation is not enough

Method used

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  • Ferric chloride ito etching solution preparation system

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Embodiment Construction

[0012] The present invention will be further described below in conjunction with specific drawings.

[0013] Such as figure 1 Shown: the ferric chloride ITO etchant preparation system comprises a mixing tank 1, a dissolving barrel 2, a pumping circulation pump 3, a weighing scale 4, a first feed port 5, a pumping pipe 6, a second Feed inlet 7, first pipeline 8, second pipeline 9, sampling valve 10, return pipeline 11, regulating valve 12, pressure gauge 13, liquid level gauge 14, etc.

[0014] Such as figure 1 As shown, the ferric chloride ITO etching solution preparation system of the present invention comprises a mixing tank 1, a dissolving barrel 2 and a pumping circulation pump 3, and the top of the mixing tank 1 is provided with a first feed port 5, which dissolves The outlet of barrel 2 is connected to the second feed port 7 on the top of the mixing tank 1 through the pumping pipe 6, and one end of the pumping circulation pump 3 is connected to the bottom of the mixing...

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Abstract

The invention relates to a ferric trichloride ITO etching liquid preparation system. The system is characterized by comprising a blending tank, a dissolving barrel and a material pumping circulating pump; a first feed port is formed at the top part of the blending tank, a discharge port of the dissolving barrel is connected with a second feed port at the top part of the blending tank through a material pumping pipe, one end of the material pumping circulating pump is connected with the bottom part of the blending tank through a first pipeline, a discharge end of the material pumping circulating pump is connected with the second feed port of the blending tank and a second pipeline respectively, an output end of the second pipeline is connected with filtering bottling equipment, the discharge end of the material pumping circulating pump is provided with a sampling branch, and a sampling valve is arranged on the sampling branch. The middle part of the blending tank is connected with a third pipeline, and the third pipe is connected with a discharge end pipeline of the material pumping circulating pump and the dissolving barrel respectively. A weighing scale is installed at the bottom part of the dissolving barrel. The ferric trichloride ITO etching liquid preparation system is high in degree of automation and good in blending effect, and the product accuracy is guaranteed.

Description

technical field [0001] The invention relates to a preparation system, in particular to a ferric chloride ITO etchant preparation system, which belongs to the technical field of chemical equipment. Background technique [0002] Indium tin oxide (ITO) conductive film has many advantages such as low resistivity, good light transmission, good high temperature stability, simple preparation and graphic processing technology, etc. It is an ideal transparent electrode material and is widely used in LCD, PDP , FED, OLED / PLED and other flat panel displays as transparent electrodes. [0003] In order to prepare the required electrode pattern, it is necessary to etch the ITO conductive film. Etching is the technique of removing material using chemical reaction or physical impact. Etching technology is divided into wet etching and dry etching, wherein wet etching uses chemical reagents to achieve the purpose of etching through chemical reactions. FeCl 3 It is an ITO etching solution,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09K13/12
CPCC09K13/12
Inventor 李虎宝朱祥龙殷泼清李冬明殷金虎
Owner ZHEJIANG SHINING ELECTRONICS MATERIALS CO LTD
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