Compensation device for uniformity of lighting pupil of photoetching machine and compensation method of compensation device

Abstract

The invention discloses a compensation device for uniformity of lighting pupil of a photoetching machine. The compensation device comprises a filter slot wheel disk on which filter slots are formed circumferentially in a spacing manner, locking components with bayonets on the outer rings, which are fixedly arranged in the filter slots of the filter slot wheel disk through positioning bolts and are provided with gear tooth lines on the peripheries, compensation filters fixedly arranged on the inner rings of the locking components, and a driving gear of which a gear body is meshed with the gear tooth lines of the locking components and which can rotate under the action of a driving motor through a shaft coupler. According to the compensation device, the gear tooth lines are arranged at the peripheries of the locking components and are meshed with the gear body of the driving gear under the action of the driving motor through the shaft coupler, so that rotation is realized under the action of the driving motor, and rotation and fixing counting is started through the driving motor; therefore, the compensation filters can automatically rotate 90 degrees to reduce repeated mounting of the identical compensation filters, and furthermore, the same compensation filter can meet the requirement on brightness adjustment in the X direction and the Y direction, and thus the positions for the filter slots are reduced.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to an illumination pupil uniformity compensation device for a photolithography machine and a compensation method thereof. Background technique [0002] At present, in the field of semiconductor lithography, the uniformity of the illumination pupil of the lithography machine is compensated by the Auto Pupil Compensation Filter (AutoPCF), whose function is to adjust the four positions of the illumination pupil in the X and Y directions. uniformity of brightness. [0003] As a person skilled in the art, it is not difficult to know that in the compensation process, the machine automatically selects the appropriate filter according to the size of the pupil light to adjust the I a , I b , I c , I d Specifically, according to the following formula of X, Y, XY to judge whether the pupil uniformity meets the requirements: [0004] X={|I c -I d | / (I c +I d )}×100%...

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Problems solved by technology

[0009] The present invention is aimed at the prior art. After installation, each filter of the existing compensation structure can only compensate the light of X or so or Y up and down. The cover correction mechanism needs to install two identical filters at the same time, and will occupy the position of the two filter slots and other defects to provide a lighting pupil uniformity compensation device for lithography machines

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