Apparatus for measuring thickness and method for measuring thickness using same

Abstract

The present invention relates to an apparatus for measuring a thickness. The present invention relates to an apparatus for measuring a thickness, which is an apparatus for measuring a thickness using a reflectometer, comprising: a light source for emitting light; a light filter unit for receiving the light emitted from the light source, selectively transmitting the light having a plurality of different frequencies so as to be modulated to the light having an intensity distribution, wherein a wavelength width of the light having the intensity distribution is adjusted; an optic system for irradiating an object being measured with the light modulated from the light filter unit, and receiving the light reflected from the object being measured; a light detection unit for receiving the light passing through the optic system so as to acquire reflection information; and a control unit for setting a plurality of frequencies capable of transmitting through the light filter unit so as to adjust the wavelength width of the light modulated by the light filter unit, and measuring the thickness of the target being measured by comparing pre-stored theoretical reflection information modelled by a mathematical formula, with reflection information acquired through the light detection unit.

Description

technical field [0001] The present invention relates to a thickness detection device and a thickness detection method using the device, and more specifically to a thickness detection device capable of improving the accuracy of thickness detection regardless of the material of the detection object or the detection position, and the thickness detection device using the device. Detection method. Background technique [0002] The distribution of the thickness of the transparent film commonly used in the LCD and semiconductor fields has a great influence on the subsequent process. Therefore, a device that can monitor the thickness of the transparent film is required in the whole society. [0003] Generally, the thickness of a thin film can be detected by a mechanical method using a probe (stylus) and an optical method, and an interferometer (Interferometer) and a reflectometer (Reflectometer) are widely used as an optical method. [0004] figure 1 It is a conceptual diagram sch...

AI Technical Summary

Problems solved by technology

[0008] However, although it is easy to generate a detected reflectance curve for the center of the detection object in the conventional thickness detection device, the more you move to the edge side of the detection object, the more the reflectance value of the reflectance distribution curve decreases, which may cause difficulty or The problem of not being able to compare with the modeled reflectance distribution curve

[0009] In addition, due to the material characteristics of the detection object, the reflectance value of the reflectance distribution curve detected from the detection object may be too high, making it difficult or impossible to compare with the modeled reflectance distribution curve

[0010] That is, depending on the material of the detection object and the detection position, there is a problem that the detection accuracy of the thickness decreases

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