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Two-grade sealing apparatus used for reduced pressure diffusion systems

A secondary sealing and external sealing technology, which is applied in the directions of diffusion/doping, crystal growth, and after treatment, can solve the problems of fragility and the outer end surface of the quartz tube are easy to burst, and achieve stress damage prevention, simple and reliable structure, and reduced The effect of small force

Active Publication Date: 2016-04-13
HUNAN RED SUN PHOTOELECTRICITY SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

According to the static force balance, the pressure caused by the pressure difference of about 0.75 bar will act on the outer end surface of the quartz tube. At the same time, the contact area between the outer end surface of the quartz tube and the stainless steel furnace door is much smaller than the contact area between the gas in the transition chamber and the stainless steel furnace door. , so the outer end surface of the quartz tube will bear a lot of pressure, and the quartz material is hard and brittle, brittle, and the outer end surface of the quartz tube is easy to burst under the action of a large external force

Method used

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  • Two-grade sealing apparatus used for reduced pressure diffusion systems

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Embodiment Construction

[0018] The present invention will be further described in detail below with reference to the drawings and specific embodiments of the specification.

[0019] Such as figure 1 As shown, an embodiment of the secondary sealing device for the reduced pressure diffusion system of the present invention includes a quartz tube 1, one end of the quartz tube 1 is provided with a concentric inner sealing end surface 11 and an outer sealing end surface 12, and the inner sealing The end face 11 is connected with a primary sealed door body 2 and forms a reaction chamber 3, and the outer sealed end face 12 is connected with a secondary sealed door body 4 and forms a transition cavity 5, and the secondary sealed door body 4 is connected to prevent the pressure of the secondary sealed door body 4 The pushing balance assembly 6 of the end face 12 of the outer seal is damaged. The secondary sealing device of the present invention pushes the secondary sealing door 4 in the direction opposite to the...

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Abstract

The invention discloses a two-grade sealing apparatus used for reduced pressure diffusion systems. The apparatus comprises a quartz tube, one orifice of the quartz tube is provided with an inner sealing end surface and an outer sealing end surface which are concentric, the inner sealing end surface is connected with a first-grade sliding door body to form a reaction cavity, the outer sealing end surface is connected with a second-grade sealing door body to form a transition cavity, and the second-stage sealing door body is connected with a push balancing assembly used for preventing pressing damages of the second-stage sealing door body to the outer sealing end surface. The two-grade sealing apparatus has the advantages of simple and reliable structure, and prevention of stress damages of the outer sealing end surface.

Description

Technical field [0001] The present invention mainly relates to the sealing technology of reduced-pressure diffusion process equipment, in particular to a secondary sealing device used for a reduced-pressure diffusion system. Background technique [0002] Compared with the traditional high-temperature and atmospheric pressure diffusion / oxidation furnace, the high-temperature and pressure-reduced diffusion / oxidation furnace has high output, good process sheet uniformity, fewer lattice defects, greatly reduced chemical and special gas loss, long maintenance period and convenient maintenance And other advantages, has broad application prospects. Due to the high-temperature vacuum diffusion / oxidation furnace adopting high-temperature negative pressure (about 0.2bar) process, the airtightness of the quartz reaction chamber is particularly critical. Insufficient sealing will cause contamination of quartz tubes, quartz boats, and silicon wafers in high-temperature processes. As the size...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B31/06
CPCC30B31/06
Inventor 李明谢振勇符慧能肖洁吴得轶
Owner HUNAN RED SUN PHOTOELECTRICITY SCI & TECH
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