Semiconductor annealing method using vacuum environment
A vacuum environment, semiconductor technology, applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device testing/measurement, electrical components, etc., can solve problems such as environmental control difficulties
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[0030] The following disclosure of the invention provides many different embodiments or examples for implementing different features of different embodiments. Specific examples of components and arrangements are described below to simplify the present disclosure. Of course, this is just an example and is not intended to limit the present invention. Additionally, the invention may repeat reference numerals and / or characters in multiple instances. This repetition is for simplicity and clarity, and does not in itself indicate a relationship between the various embodiments and / or configurations described.
[0031] As described herein, exemplary embodiments of the present invention utilize a vacuum environment to eliminate and / or mitigate problems caused by anneal chamber gases during the anneal process. In a generalized embodiment, a semiconductor annealing system includes an annealing chamber, a heating element, and a vacuum pump connected to the annealing chamber to establish ...
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