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Film thickness measuring device

A technology for measuring device and film thickness, which is applied in the direction of measuring device, instrument, scientific instrument, etc., and can solve the problems that cannot be uniformly corrected, and cannot accurately calculate the thickness of Al film 102

Inactive Publication Date: 2015-03-11
SHARP KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Thus, there is a problem that the thickness of the Al film 102 cannot be accurately obtained due to the influence of the aluminum component contained in the substrate 101.
In particular, the aluminum component contained in the substrate 101 may vary for each substrate 101 and cannot be uniformly corrected.

Method used

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Embodiment Construction

[0048] Hereinafter, the present invention will be described in detail using the illustrated embodiments.

[0049] figure 1 It is a plan view showing the film thickness measurement device of one embodiment of the present invention. figure 2 From figure 1 A side view viewed in the direction of the arrow U. Such as figure 1 and figure 2 As shown, the film thickness measuring device has a base 1 , a substrate table 2 , a calibration table 3 , a gantry 4 , a slider 5 , a plurality of measuring devices 21 , 22 , 23 , and a control unit 30 .

[0050] The substrate stage 2 is provided on the base 1 and includes a plurality of stages. The film-formed product substrate 10 is placed on the substrate stage 2 .

[0051] The above-mentioned substrate table 2 is provided with a plurality of air holes 2a, and air is sucked in from the air holes 2a, whereby the product substrate 10 can be closely attached to the substrate table 2, and on the other hand, air is blown out from the air...

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Abstract

A substrate Al detection means (33a) irradiates primary X-rays from a measurement head (23) onto a substrate (11) before film formation, detects, by means of the measurement head (23), X-ray fluorescence generated from the substrate (11), and detects the aluminum component contained in the substrate (11). When an Al film has been formed on the substrate (11), an Al film correction means (33b) corrects, on the basis of the detection results of the substrate Al detection means (33a), the intensity of the X-ray fluorescence detected from the Al layer by means of the measurement head (23) and calculates the thickness of the Al film.

Description

technical field [0001] The present invention relates to a film thickness measuring device for measuring a film thickness on a substrate. Background technique [0002] Conventionally, as a film thickness measuring device, there is a device described in JP-A-3-94444 (Patent Document 1). In this film thickness measuring device, a film on a substrate is irradiated with raw X-rays, fluorescent X-rays generated by the film are detected, and the film thickness is obtained from the intensity of the fluorescent X-rays. [0003] However, if Figure 8 As shown, an Al film 102 containing aluminum is laminated on a substrate 101, the substrate 101 is, for example, Al 2 o 3 In the case of a glass substrate containing aluminum, when the original X-ray 150 is irradiated to the Al film 102, in addition to detecting the fluorescent X-ray 152 generated by the Al of the Al film 102, the Al of the substrate 101 is also detected. Generates fluorescent X-rays 151 . [0004] Thus, there is a pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B15/02
CPCG01B15/02G01N23/223G01N2223/633
Inventor 方志教和坂上英和原田德实山胁千明
Owner SHARP KK
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