Magnetron sputtering coating method and system

Abstract

The invention provides a magnetron sputtering coating method and system, belonging to the technical field of display. The magnetron sputtering coating system comprises a sputtering chamber, a target set, a substrate carrier and a transmission device, wherein the target set is arranged in the sputtering chamber and formed by splicing a plurality of targets; the substrate carrier is arranged opposite the target set and used for carrying a film-forming substrate; and the transmission device is used for driving the substrate carrier to reciprocate in the target arrangement direction. The technical scheme provided by the invention can effectively enhance the magnetron sputtering coating uniformity, thereby ensuring the performance and quality of the display substrate.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a magnetron sputtering coating method and system. Background technique [0002] In the magnetron sputtering coating equipment of the 6th generation and above, due to the large size of the display substrate, multiple targets are generally spliced ​​to form a target group to form a sputtering film on the display substrate, and each target is controlled by a separate power supply , Different targets are relatively independent and insulated. In order to ensure the insulation and independence of each target, the targets must be isolated, and the isolation area between the targets is a non-sputtering area. [0003] In the process of film formation, since the isolation area between the targets is a non-sputtering area, the film layer deposited on the substrate corresponding to the gap between the targets will be thinner, resulting in poor uniformity and stability of the film layer; esp...

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Problems solved by technology

[0003] In the process of film formation, since the isolation area between the targets is a non-sputtering area, the film layer deposited on the substrate corresponding to the gap between the targets will be thinner, resulting in poor uniformity and stability of the film layer; especially For targets such as IGZO and ITO, if the film layer corresponding to the target gap is too thin, it will easily lead to defects such as mura (spot) in the display substrate, which will have a great impact on the performance and quality of the display substrate.

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