Space water droplet positioning substrate and preparation method thereof

A positioning-based, water-based technology, applied in separation methods, chemical instruments and methods, evaporation, etc., to achieve the effects of simple and effective preparation method, precise size, and controllable structure of alternating hydrophilic and hydrophobic regions

Inactive Publication Date: 2015-02-11
INST OF MECHANICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The modification of the wettability of the substrate surface will control the wetting angle and droplet volume during the droplet evap

Method used

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  • Space water droplet positioning substrate and preparation method thereof
  • Space water droplet positioning substrate and preparation method thereof
  • Space water droplet positioning substrate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] The present invention provides as attached figure 1 A spatial water-based droplet positioning substrate is shown, the surface of the substrate is a thin film with alternating structure of hydrophilic regions and hydrophobic regions; the shape of the hydrophilic region can be designed into any geometric shape, and the hydrophobic region will be hydrophilic Surrounded by the area, it plays the role of confining the water-based liquid droplets 1 .

[0038] The positioning substrate is divided into two layers, namely the hydrophilic substrate 3 and the hydrophobic film 2 covering the hydrophilic substrate 3, the hydrophobic film 2 does not completely cover the hydrophilic substrate 3; the hydrophilic area is the exposed area of ​​the hydrophilic substrate 3, and the hydrophobic film 2 covers the hydrophilic substrate 3; The area is the area covered by the hydrophobic membrane 2.

[0039] The invention provides a method for preparing a spatial water-based droplet positionin...

Embodiment 2

[0050] The present invention provides as attached figure 1 Another shown spatial water-based droplet positioning substrate differs from Embodiment 1 in that:

[0051] In this embodiment, the hydrophilic substrate is a quartz plate, and the covering method adopts an aluminum film covering method. Specific steps are as follows:

[0052] (1) Clean the hydrophilic substrate: clean the surface of the quartz slice with detergent first, then place it in an acetone solution for ultrasonic cleaning for 30-60 minutes, take out the quartz slice after ultrasonication, and wash it repeatedly with absolute ethanol and deionized water until it is clean . In this embodiment, the length, width, and height of the base material are selected as 25mm*80mm*1mm, but the size of the base in the present invention is not limited to this, and can be adjusted as required.

[0053] (2) Covering film preparation: This implementation adopts the aluminum film covering method. In this embodiment, the func...

Embodiment 3

[0058] The present invention provides as attached figure 1 Another shown spatial water-based droplet positioning substrate differs from Embodiment 1 in that:

[0059] In this embodiment, the hydrophilic substrate is a silicon wafer, the covering method adopts a photoresist covering method, and the photoresist adopts reverse glue. Specific steps are as follows:

[0060] (1) Clean the hydrophilic substrate: clean the surface of the silicon wafer with detergent first, then place it in an acetone solution for ultrasonic cleaning for 30-60 minutes, take out the silicon wafer after ultrasonication, and wash it repeatedly with absolute ethanol and deionized water until it is clean . In this embodiment, the length, width, and height of the base material are selected as 25mm*80mm*1mm, but the size of the base in the present invention is not limited to this, and can be adjusted as required.

[0061] (2) Preparation of covering film: In this embodiment, a photoresist covering method i...

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Abstract

The invention provides a space water droplet positioning substrate. The surface of the substrate is provided with a film with an alternating structure of a hydrophilic region and a hydrophobic region, wherein the hydrophilic region can be designed to be of any geometric shape; the hydrophobic region encircles the hydrophilic region, and achieves an effect of limiting a water droplet. According to the invention, the defects that the size of a droplet, a contact angle of the droplet and the like cannot be limited effectively in traditional droplet evaporation are overcome; a novel substrate material is provided for droplet evaporation, is beneficial to fluid management in space, and also can be applied to positioning and quantitative research of biological reaction containers and the like; a preparation method is simple, convenient and effective; the hydrophilic and hydrophobic alternating region structure can be controlled; the size is precise to be micron order, and the space water droplet positioning substrate and the preparation method are suitable for multiple substrate materials.

Description

technical field [0001] The invention relates to a surface modification of a substrate material required for a space droplet evaporation experiment, in particular to a space water-based droplet positioning substrate and a preparation method thereof. Background technique [0002] Smart material is a new type of composite material developed rapidly in the 1990s. Its achievements since its development and its influence and penetration in various fields have always attracted attention. Materials whose physical properties and structures change by infiltration on the solid surface are important smart materials. The wetting property of solid surface refers to the wettability of liquid to solid. This property is divided into hydrophilicity and hydrophobicity. If the surface wetting angle of a solid material is greater than 65°, the surface of the material is hydrophobic; otherwise, the wetting angle is less than 65°, indicating that The surface of the material is hydrophilic. The m...

Claims

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Application Information

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IPC IPC(8): B01D1/00
Inventor 吴赛蓝鼎王育人
Owner INST OF MECHANICS - CHINESE ACAD OF SCI
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