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Nano caliper based on double-probe AFM and method for measuring key dimension of micro-nano structure through nano caliper

An atomic force microscope, micro-nano structure technology, applied in scanning probe microscopy, measurement devices, optical devices, etc., can solve difficult side wall surface scanning, difficult, difficult adjacent and relative area scanning imaging and measurement issues

Inactive Publication Date: 2014-09-17
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The traditional atomic force microscope (AFM) uses the Top-Down method to observe the surface topography of the sample. The probe cannot be rotated, and the needle tip faces the base of the optical microscope. It is difficult to scan the surface of the side wall at a large angle to the plane of the base.
The main function of this kind of AFM is to realize the scanning imaging and measurement of the surface parallel to the substrate or the oblique surface with a small angle to the substrate, but it is difficult to realize the adjacent and opposite side wall surfaces that often appear in the sample. Relative area scanning imaging and measurement, that is, it is difficult to realize the key micro-nano structures such as line width, line width roughness, line edge roughness, groove depth, and side wall inclination angle between the adjacent and opposite surface of the two side wall surfaces Measurement of size

Method used

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  • Nano caliper based on double-probe AFM and method for measuring key dimension of micro-nano structure through nano caliper
  • Nano caliper based on double-probe AFM and method for measuring key dimension of micro-nano structure through nano caliper
  • Nano caliper based on double-probe AFM and method for measuring key dimension of micro-nano structure through nano caliper

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specific Embodiment approach 1

[0046] Specific implementation mode one: combine figure 2 To illustrate this embodiment, the nanocaliper based on a dual-probe atomic force microscope described in this embodiment includes a dual-probe atomic force microscope and two probe racks 24 with the same structure, and the probe rack 24 includes a base 24-1 and a The rotating arm 24-3, the rotating arm 24-3 is arranged on the base 24-1, and the rotating arm 24-3 can rotate around its central axis, and the two bases 24-1 are respectively used for the two probe holders 24 is fixed on the first probe hand 18 and the second probe hand 11 of the double-probe atomic force microscope, and the No. 1 probe and No. 2 probe of the double-probe atomic force microscope are respectively fixed on the rotation of the two probe racks 24. On the arm 24-3, the cross-section of the No. 1 probe is circular or oval, and the No. 2 probe has the same structure as the No. 1 probe.

[0047] The nanocaliper based on the dual-probe atomic force...

specific Embodiment approach 2

[0049] Specific implementation mode two: combination figure 1 and image 3 Describe this embodiment. This embodiment is a further limitation of the nanocaliper based on the dual-probe atomic force microscope described in Embodiment 1. In this embodiment, the dual-probe atomic force microscope includes an optical microscope 1 and a host computer 20 , the first laser mechanics subsystem, the second laser mechanics subsystem, the first probe hand 18, the second probe hand 11, the second XYZ micro-positioning stage 12, the second XYZ nano-positioning stage 13, and the XY micro-positioning stage 14 , the first XYZ nano-positioning stage 15, the sample stage 16 and the first XYZ micro-positioning stage 17, the dual-way probe controller 23, the acquisition card 19, two piezoelectric controllers 21, the No. 1 switcher 22, and the No. 2 switch Device 25 and No. 3 switch 26;

[0050] The first laser mechanics subsystem is used to detect the force signal or resonance signal of the firs...

specific Embodiment approach 3

[0055] Embodiment 3: This embodiment is a further limitation of the nanocaliper based on the dual-probe atomic force microscope described in Embodiment 1. In this embodiment, the dual-way probe controller 23 uses an OC4-Dual probe Dynamic controller implementation.

[0056] The signal bandwidth collected by the OC4-Dual probe dynamic controller can reach 5MHz, which makes the control more stable.

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Abstract

The invention relates to the nano caliper measurement technology of an AFM and discloses a nano caliper based on a double-probe AFM and a method for measuring the key dimension of a micro-nano structure through the nano caliper. The nano caliper based on the double-probe AFM and the method for measuring the key dimension of the micro-nano structure through the nano caliper aim to solve the problem that relevant key dimension measurement of two adjacent or opposite side walls to be measured is difficult to achieve through a traditional AFM. Based on the principle of the double-probe AFM, two rotary probe frames are designed, so that any angle ranging from -90 degrees to 90 degrees is formed between two probes and the bottom face, and when the two probes are the same in rotation angle and are opposite in direction, the nano caliper is formed, the surfaces of the two adjacent or opposite side walls can be scanned, and the key dimension of the micro-nano structure can be obtained according to scanning data. On the premise of not destroying samples, the adjacent and opposite areas of the surfaces of the two side walls are scanned to form an image, and the key dimension of the samples is obtained according to the scanning data. The nano caliper based on the double-probe AFM and the method for measuring the key dimension of the micro-nano structure through the nano caliper are applicable to measurement of the key dimension of micro-nano devices and can be applied to micro-nano manufacturing, testing and micro-nano operating fields.

Description

technical field [0001] The invention relates to a nano-caliper measurement technology based on a double-probe atomic force microscope (AFM). Background technique [0002] The measurement of the adjacent and opposite side wall surfaces in the sample is an important means to detect the processing performance of the sample in the semiconductor industry. How to realize the scanning of the two side wall surfaces in the sample and the measurement of critical dimensions is to improve the detection efficiency of micro-nano structures and the key to processing technology. The traditional atomic force microscope (AFM) uses the Top-Down method to observe the surface topography of the sample. The probe cannot be rotated, and the needle tip faces the base of the optical microscope. It is difficult to scan the surface of the side wall at a large angle to the plane of the base. The main function of this kind of AFM is to realize the scanning imaging and measurement of the surface parallel...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/38G01Q60/24G01B11/00
Inventor 谢晖杨锋
Owner HARBIN INST OF TECH
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