Vertical oxidizing furnace process door cooling method and device used in wet oxidation process
A cooling method and oxidation furnace technology, applied in vertical furnaces, furnaces, furnace components, etc., can solve the problems of high reprocessing cost, can not be changed at will, affect production capacity, etc., achieve good maintenance, increase costs, and avoid water droplets Effect
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Embodiment 1
[0039] First of all, the equipment structure of a semiconductor vertical oxidation furnace used in the present invention is introduced.
[0040] In this example, see figure 1 and figure 2 , figure 1 It is a structural schematic diagram of the carrier and sealing mechanism in a semiconductor vertical oxidation furnace; figure 2 yes figure 1 The top view of the process door sealing mechanism in .
[0041] Such as figure 1 As shown, in the process, in order to ensure a good thermal field, a thermal insulation barrel 4 is installed on the top of the process door. The function of the insulation barrel is to prevent the heat loss inside the furnace body, and to prevent the high temperature radiation from damaging the process door and nearby components. A quartz boat 6 is installed on the top of the heat preservation bucket, which is used to carry a process chip (silicon chip) 5 .
[0042] Simultaneously, in order to realize the tightness of process door better, on process doo...
Embodiment 2
[0065] In the present embodiment, the method and device in the first embodiment are used to set and control the relevant process parameters as follows:
[0066] (1) The wet oxygen process temperature is 700-800°C;
[0067] (2) The main process is: 700°C wet oxygen process for 30-60 minutes, H2:O2=6SLM:4.5SLM; 700°C to 800°C wet oxygen process for 20-30min, H2:O2=6SLM:4.5SLM; 800°C wet oxygen process for 60-120min, H2:O2=6SLM:4.5SLM; N2 purge at 800°C for 30-60min, N2 flow rate is 10SLM;
[0068] (3) The circulating cooling water flow rate of the process door and the bottom of the furnace body is 1-2L / min.
[0069] In the process, if the temperature detected by the thermocouple on the process door and the bottom of the furnace body exceeds the temperature limit temperature of the sealing part of the process door, and the flow rate of circulating cooling water has reached the upper limit of the set flow rate in the corresponding wet oxygen process temperature range, press its ...
Embodiment 3
[0073] In the present embodiment, the method and device in the first embodiment are used to set and control the relevant process parameters as follows:
[0074] (1) The wet oxygen process temperature is 400-500°C;
[0075] (2) The main process is: 400°C wet oxygen process for 30-60min, H2:O2=6SLM:4.5SLM; 400°C to 500°C wet oxygen process for 20-30min, H2:O2=6SLM:4.5SLM; 500°C wet oxygen process for 60-120min, H2:O2=6SLM:4.5SLM; N2 purge for 30-60min at 500°C, N2 flow rate is 10SLM;
[0076] (3) The circulating cooling water flow rate of the process door and the bottom of the furnace body is 0.1-1L / min;
[0077] In the process, if the temperature detected by the thermocouple on the process door and the bottom of the furnace body exceeds the temperature limit temperature of the sealing part of the process door, and the flow rate of circulating cooling water has reached the upper limit of the set flow rate in the corresponding wet oxygen process temperature range, press its 2~3...
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