Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for regulating morphology and structure of nanometer silicon

A nano-silicon and morphology technology, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of complex conditions for controlling morphology, environmental pollution, etc., and achieve high purity, simple process flow, reaction equipment and reaction. Effects with low requirements

Active Publication Date: 2014-02-26
北京华科讯能石墨烯新技术研究院有限公司
View PDF4 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these preparation methods are carried out in multiple steps, and the conditions for controlling the morphology are relatively complicated; at the same time, etchant or protective agent must be introduced, and these reagents need to be post-processed, otherwise they will pollute the environment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for regulating morphology and structure of nanometer silicon
  • Method for regulating morphology and structure of nanometer silicon
  • Method for regulating morphology and structure of nanometer silicon

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Add 80 mg of silicon particles with a particle size of 100 nm into a mixed solution of 20 ml of water and 120 ml of ethanol, and ultrasonically disperse for 20 min. Add 2 ml of 30% ammonia water to the above solution, and stir at constant temperature for 10 min. The stirred product was immediately centrifuged, washed with a large amount of ethanol until neutral, and then dried in a vacuum oven.

[0018] as attached figure 1 As shown by transmission electron microscopy (TEM), the obtained silicon / silica material has a core-shell structure.

Embodiment 2

[0020] Add 80 mg of silicon particles with a particle size of 100 nm into a mixed solution of 20 ml of water and 120 ml of ethanol, and ultrasonically disperse for 20 min. Add 2ml of 30% ammonia water to the above solution, and stir at constant temperature for 1h. The stirred product was immediately centrifuged, washed with a large amount of ethanol until neutral, and then dried in a vacuum oven.

[0021] as attached figure 2 As shown by transmission electron microscopy (TEM), the obtained silicon / silica material has an egg yolk eggshell structure.

Embodiment 3

[0023] Add 80 mg of silicon particles with a particle size of 100 nm into a mixed solution of 20 ml of water and 120 ml of ethanol, and ultrasonically disperse for 20 min. Add 2ml of 30% ammonia water to the above solution, and stir at constant temperature for 24h. The stirred product was immediately centrifuged, washed with a large amount of ethanol until neutral, and then dried in a vacuum oven.

[0024] as attached image 3 As shown by transmission electron microscopy (TEM), the obtained silica material has a hollow structure.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for regulating the morphology and the structure of nanometer silicon. The method is characterized in that the crystal silicon is adopted as a precursor, a water-ethanol-ammonia water mixed solution is adopted as a reaction system, and the crystal silicon is stirred and reacted in the mixed solution at a constant temperature. By controlling the volume ratio of the water to the ethanol and the reaction time, silicon / silicon dioxide composite nanometer particles respectively with nuclear shells, egg yolk shells and hollow structures can be obtained. By adopting the method, a novel method can be provided for the mass application of a silicon-based material in the fields such as lithium ion batteries, catalysts, medicine releasing agents, nanometer reactors and the like.

Description

technical field [0001] The invention relates to a method for regulating and controlling the morphology and structure of nano-silicon, which can obtain core-shell, egg-yolk-shell and hollow structures, and belongs to the technical field of chemical synthesis. Background technique [0002] As a traditional semiconductor material, silicon has been widely used in the fields of chips and memory devices. Because silicon has the highest known theoretical capacity, it is also regarded as a very potential high-capacity lithium ion battery anode material[Wu H, Cui Y. Designing nanostructured Si anodes for high energy lithium ion batteries[J]. Nano Today , 2012]. In recent years, the synthesis and preparation of silicon dioxide have received widespread attention [Zhang T, Ge J, Hu Y, et al. Formation of hollow silica colloids through a spontaneous dissolution–regrowth process] [Wong Y J, Zhu L, Teo W S, et al. Revisiting the stober method: inhomogeneity in silica shells[J]. Journal o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/021
Inventor 宋怀河牛津张苏
Owner 北京华科讯能石墨烯新技术研究院有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products