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Apparatus for performing a plasma chemical vapor deposition process

A chemical vapor deposition and plasma technology, which is applied in gaseous chemical plating, electrical components, manufacturing tools, etc., can solve the problems of high power consumption, temporary attenuation or even disappearance of plasma, etc.

Active Publication Date: 2017-05-24
DRAKA COMTEQ BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The breakdown process consumes a lot of power, which means that the plasma itself may temporarily decay or even disappear, which has negative consequences for any product made through the plasma process

Method used

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  • Apparatus for performing a plasma chemical vapor deposition process
  • Apparatus for performing a plasma chemical vapor deposition process
  • Apparatus for performing a plasma chemical vapor deposition process

Examples

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Embodiment Construction

[0016] It should be noted that the drawings only show preferred embodiments according to the invention. In the drawings, the same reference numerals denote the same or corresponding parts.

[0017] figure 1 A schematic cross-sectional side view of a first embodiment of the device 1 according to the invention is shown. The device 1 comprises a substantially cylindrical resonator 2 . The device also includes a microwave waveguide 3 that guides microwaves to the resonator 2 . The microwave waveguide 3 is preferably rectangular, so that an optimal interface can be formed between the waveguide 3 and the resonator 2 . The device can be used to perform a plasma chemical vapor deposition process.

[0018] The resonator 2 is provided with a cylindrical outer wall 4 surrounding a resonator cavity 5 . The cavity has a substantially rotationally symmetrical shape with respect to the axis C of the cylinder. The resonator 2 is also provided with side wall portions 6a, 6b delimiting th...

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Abstract

The invention relates to a device for performing a plasma chemical vapor deposition process. The device comprises a substantially cylindrical resonator provided with a cylindrical outer wall surrounding a resonant cavity having a substantially rotationally symmetrical shape with respect to the cylinder axis. The resonator also includes side wall portions bounding the resonant cavity in the direction of the opposite cylinder axis. Additionally, the device includes a microwave waveguide extending through the cylindrical outer wall into the resonant cavity. The length of the cavity in the direction of the cylinder varies according to the radial distance from the axis of the cylinder.

Description

technical field [0001] The present invention relates to a device for performing a plasma chemical vapor deposition process comprising a substantially cylindrical resonator provided with a cylindrical outer wall surrounding a resonant cavity having a substantially rotational axis with respect to the cylinder axis Symmetrical in shape, the resonator is also provided with side wall portions confining the resonant cavity along opposite cylindrical axis directions, wherein the device further includes a microwave waveguide portion, one end of which extends through the cylindrical outer wall into the resonant cavity. Background technique [0002] European Patent Publication EP 1867610 in the name of Draka Comteq B.V. discloses such an apparatus for manufacturing optical fibers. [0003] When high power microwaves are applied to long duration processes, problems with load matching can arise due to internal reflections and susceptibility to arcing. If the loads are not matched, the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/44H01P7/06
CPCC03B37/0183H01J37/32229H01J37/32256C23C16/511C03B37/018
Inventor M·J·N·范斯特拉伦I·米利塞维克J·A·哈特苏伊克
Owner DRAKA COMTEQ BV
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