Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wide-range wavelength-tunable etalon

An etalon and wide-ranging technology, applied in the field of optical etalons, can solve problems such as difficult to realize wavelength adjustment, small wavelength adjustment range, and limited applicable range, etc., and achieve the effect of simple structure, easy production and easy control

Active Publication Date: 2013-05-22
SHANGHAI PRIMANEX PHOTOELECTRIC TECH
View PDF8 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the above-mentioned prior art, there is a problem of short-term or long-term drift in the scheme of motor or piezoelectric ceramics to change the cavity length to realize wavelength adjustment, and the reliability is poor
However, the thermo-optic or electro-optic effect changes the refractive index of the cavity to achieve wavelength tunability, which has the disadvantage of a small wavelength adjustment range, and it is difficult to achieve wavelength tunability in the entire C or L band.
For example, the currently commonly used temperature adjustment technology can adjust the wavelength range within 10nm, so its applicable range is greatly limited

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wide-range wavelength-tunable etalon
  • Wide-range wavelength-tunable etalon

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031]In this embodiment, in order to realize that the cavity length of the above-mentioned resonant cavity can change with temperature, the etalon in this embodiment contains temperature-sensitive materials, specifically including two substrates and three transition layers. These two substrates have the same structure, specifically the first substrate 103 and the second substrate 107 arranged in parallel, the three transition layers are respectively two side transition layers and a central transition layer 106, the two side transition layers The reference numbers are 104 and 105, respectively. The thickness of the central transition layer 106 is less than the thickness of the two side transition layers, and the two side transition layers have the same shape and are erected between the two substrates parallel to each other, and the central transition layer 106 is arranged in the middle of the two side transition layers. One surface of the central transition layer 106 is closel...

Embodiment 2

[0045] In this embodiment, in order to realize that the cavity length of the above-mentioned resonant cavity can change with temperature, the etalon in this embodiment includes two pieces of temperature-sensitive materials. Specifically, there are two substrates made of transparent materials and a transition layer made of temperature-sensitive materials. like figure 2 As shown, the two substrates include a first substrate 203 and a second substrate 207 arranged in parallel, and the two transition layers are a central transition layer 206 and an annular tubular side transition layer 204 respectively. The thickness of the central transition layer 206 is smaller than that of the side transition layer 204 , and the annular tubular side transition layer 204 is erected between two substrates during installation, and the central transition layer 206 is disposed in the middle of the side transition layer 204 . One surface of the central transition layer 206 is closely attached to an...

Embodiment 3

[0055]In this embodiment, in order to realize that the cavity length of the above-mentioned resonant cavity can change with temperature, the etalon in this embodiment includes two kinds of materials. Specifically, there are two substrates made of transparent materials and a transition layer made of different materials. The structural form of this embodiment and embodiment 2 is identical, and the difference is that the thermal expansion coefficient difference of two kinds of materials that make transition layer is bigger, and promptly side transition layer 204 selects the material that thermal expansion coefficient is α1 for use, and this material is at temperature T0 The length is L1; the central transition layer 206 in the middle is a material with a thermal expansion coefficient α2, and its length is L2 at the temperature T0. Wherein, the coefficient of thermal expansion α1 is much smaller than the coefficient of thermal expansion α2, and the ideal situation is that the coef...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a wide-range wavelength-tunable etalon which comprises a first base plate and a second base plate. The first base plate is parallel with the second base plate. A side transition layer for supporting is arranged between the first base plate and the second base plate and is made of material with thermal expansion coefficient alpha1. A central transition layer is further disposed between the first base plate and the second base plate and is made of material with thermal expansion coefficient alpha2. The central transition layer is thinner than the side transition layer. One surface of the central transition layer is tightly attached to the inner side of the first base plate. A width-variable clearance is reserved between the opposite surface of the central transition layer and the inner side of the second base plate and serves as a resonant cavity for beam reflection or transmission. The wide-range wavelength-tunable etalon allows central wavelength to be tuned in wide range. According to the concept, the etalon is made of different materials so as to adaptive to different service environments and is simple in structure and convenient to manufacture.

Description

technical field [0001] The invention relates to the field of optics, in particular to an optical etalon capable of adjusting wavelengths in a wide range. Background technique [0002] Wavelength tunable devices are widely used in the fields of optical communication and optical measurement. Currently commonly used technologies for wavelength tunable devices include temperature regulation, electro-optic technology, piezoelectric ceramic technology, mechanical regulation, and microelectromechanical regulation. Among them, temperature regulation uses the thermal expansion effect or thermo-optic effect of the material or a combination of the two; electro-optic technology uses the application of an electric field to the material to change its dielectric constant to adjust the wavelength; piezoelectric ceramic technology uses the application of an electric field to the material to change its thickness to adjust the wavelength; Mechanical adjustment and microelectromechanical a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B26/00
CPCG01J3/26G02B26/00H01S3/10G02B26/001
Inventor 赵强郭磊
Owner SHANGHAI PRIMANEX PHOTOELECTRIC TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com