Manual lithography machine aligns the workbench z-direction coarse micro-motion mechanism

Abstract

The invention relates to a macro / micro-motion mechanism for aligning a manual photoetching machine to the Z-direction of a workbench, and belongs to the technical field of an adjacent contact type manual photoetching machine. The macro / micro-motion mechanism comprises a differential thread mechanism, a ratchet friction adjusting mechanism, a friction type ratchet mechanism, a macro-motion locking mechanism, a micro-motion spacing device, a macro-motion spacing device and a structure rack. Z-direction macro-motion can be realized by a large-lead multi-head thread, and the micro-separation of the Z-direction micro-motion is realized by a fine thread arranged on the macro-motion mechanism. In order to enhance the accuracy of the differential strength during the Z-direction micro-motion, a brake block is driven to lock the Z-direction macro-motion by adopting a locking air cylinder, the balancing force is transferred by the friction type ratchet mechanism, the acting force of a spring to a pallet is changed, and the micro-force balancing and the balancing adjustment are realized. The macro / micro-motion mechanism has a favorable effect, and can realize the rapid micro-motion and rapid macro-motion of the adjacent contact type manual photoetching machine toward the Z-direction, and further has the advantages of small balancing force, adjustable balancing force, simple structure, stable and reliable performance, convenience in use and maintenance, favorable actual use effect and wide application scope.

Description

technical field [0001] The invention relates to the technical field of manual lithography equipment, in particular to a Z-direction coarse and fine movement mechanism for aligning a workbench of a manual lithography machine. Background technique [0002] The Z-direction coarse and fine-motion mechanism of the manual lithography machine alignment workbench requires that the Z-direction can rise or fall quickly, and can rise or fall slightly, so as to realize the leveling, locking, and micro-separation of the glued surface of the substrate and the pattern surface of the mask Re-contact work, at the same time, it has the functions of automatic compensation for sheet thickness and easy adjustment of leveling force. This mechanism is the core component of the manual lithography machine—one of the key mechanisms in the alignment table. This mechanism directly reflects the technical level of the manual lithography machine's development, production, manufacturing, assembly, etc., an...

AI Technical Summary

Problems solved by technology

When the diaphragm cylinder is used to realize the lifting movement, the magnitude of the leveling force is affected by the change of the compressed air pressure, and the fluctuation range is large, and the micro-separation amount is a fixed value that cannot be adjusted, and the change of the micro-separation amount cannot be realized, which affects the alignment accuracy; When the transmission realizes the lifting movement, there is no distinction between coarse and fine movements. The leveling force and differential force are determined entirely by personal experience, which affects the quality of chip graphics.

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