Preparation method of self-supporting crack-free photonic crystal

A photonic crystal, crack-free technology, applied in the direction of crystal growth, chemical instruments and methods, single crystal growth, etc., can solve the problems of pollution in the preparation process, non-universal, unsafe hidden dangers, etc., to improve optical performance, avoid Diffuse effect, low cost effect

Active Publication Date: 2015-08-19
INST OF CHEM CHINESE ACAD OF SCI
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are the following disadvantages in the above-mentioned preparation process: 1. The prepared product can only avoid the generation of cracks on some low bulk density crystal planes, while other high bulk density crystal planes still have cracks; 2. The preparation cost is high , the process is cumbersome; 3. The preparation process is seriously polluted and has potential safety hazards; 4. The preparation method is only applicable to certain colloidal particles and is not universal

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of self-supporting crack-free photonic crystal
  • Preparation method of self-supporting crack-free photonic crystal
  • Preparation method of self-supporting crack-free photonic crystal

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] The monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles with a particle diameter of 80nm are ultrasonically dispersed in water to form an emulsion (the concentration of the emulsion is 0.01wt%), and the resulting emulsion is heated at a temperature of 5°C , the humidity is placed on the surface of the polydimethylsiloxane plate under the condition of 5% (the contact angle between the plate and water is 91 °), and the self gravity of the monodisperse latex particles is deposited, and the polydimethylsiloxane The self-supporting non-crack opal photonic crystal with a photon band gap of 200nm formed by the assembly of the monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles was obtained on the surface of the base siloxane plate.

[0022] Using the self-supporting crack-free opal photonic crystal prepared above as a sacrificial template, the SiO 2 The sol is drip-coated in the gap between the monodisperse poly(styrene-methyl me...

Embodiment 2

[0024] The monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles with a particle diameter of 1100nm are ultrasonically dispersed in water to form an emulsion (the concentration of the emulsion is 30wt%). Humidity is placed on the surface of the polyurethane hydrophobic sheet under the condition of 95% (the contact angle between the sheet and water is 100 °), and the self gravity of the monodisperse latex particles is deposited, and the surface of the polyurethane sheet is obtained by the described Monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles assembled to form a self-supporting non-crack opal photonic crystal with photonic band gap at 2600nm.

[0025] Using the self-supporting crack-free opal photonic crystal prepared above as a sacrificial template, the TiO 2 The sol is filled into the gap between the monodisperse poly(styrene-methyl methacrylate-acrylic acid) latex particles as a sacrificial template by pulling method, and ...

Embodiment 3

[0027]Monodisperse polystyrene latex particles with a particle size of 1100nm are ultrasonically dispersed in water to form an emulsion (the concentration of the emulsion is 30wt%). The surface of the vinyl sheet (the contact angle between the sheet and water is 130°) is deposited by the self gravity of the monodisperse latex particles, and the surface of the polyethylene sheet is formed by assembling the monodisperse polystyrene latex particles. A self-supporting crack-free opal-structured photonic crystal with a photonic band gap of 2600 nm.

[0028] Using the self-supporting crack-free opal photonic crystal prepared above as a sacrificial template, the TiO 2 The sol is filled into the gap between the monodisperse polystyrene latex particles as a sacrificial template by pulling method, and calcined at 500°C to remove the monodisperse polystyrene latex particles to obtain a forbidden band Self-supporting crack-free TiO at 2500nm 2 Inverse opal structured photonic crystals. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention relates to a preparation method of a self-supporting crack-free photonic crystal, in particular to a preparation method of self-supporting crack-free opal structured photonic crystal and self-supporting crack-free inverse opal structured photonic crystal. By the adoption of a method for depositing monodisperse emulsion particles on a hydrophobic surface by the gravity of the emulsion particles, preparation of the self-supporting crack-free photonic crystal can be simply realized. The prepared self-supporting crack-free photonic crystal can be further used as a sacrificial template to prepare the self-supporting crack-free inverse opal structured photonic crystal. The preparation method provided by the invention requires low cost, is simple to operate, is green and environmentally friendly, and has good universality. In addition, the prepared photonic crystal has advantages of no crack, self-supporting, excellent optical performance and the like. The preparation method can be actually used in the fields of high-performance optical devices, chemistry, biochemical detection and the like.

Description

technical field [0001] The invention relates to a preparation method of a self-supporting crackless photonic crystal, in particular to a preparation method of a self-supporting crackless opal structure photonic crystal and a self-supporting crackless inverse opal structure photonic crystal. Background technique [0002] Since the advent of photonic crystals in 1987, due to their special light regulation properties, they have broad application prospects in optics, electronics, chemistry, biochemistry and other fields. The use of chemical self-assembly to prepare photonic crystals has the advantages of low cost and simple operation, which attracts the research interests of scientific researchers. However, in the process of preparing photonic crystals by chemical self-assembly method, the latex particles will shrink during the final drying process, and the viscous force between the latex particles and the substrate prevents them from shrinking, so the resulting tensile stress ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C30B5/00
Inventor 周金明王京霞宋延林
Owner INST OF CHEM CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap