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Large height-width ratio photon sieve and preparation method thereof

A technology of photon sieve and aspect ratio, which is applied in the fields of microelectronics and optics, can solve problems such as the easy collapse of photoresist columns, and achieve the effects of reduced production costs, high success rate, and simple manufacturing methods

Inactive Publication Date: 2012-07-25
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

[0009] In order to solve the above-mentioned defects, the present invention provides a photon sieve with a large aspect ratio and its preparation method to solve the defect that the photoresist column is easy to collapse

Method used

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  • Large height-width ratio photon sieve and preparation method thereof
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  • Large height-width ratio photon sieve and preparation method thereof

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Embodiment Construction

[0040] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0041] According to Babinet's principle, it can be known that under the illumination of a point light source, two complementary diffraction screens u0(x, y), uc(x, y) are on the plane conjugate to the point light source, except for the geometric image point of the point light source , both have the same Fraunhofer diffraction pattern. The invention utilizes the Babinet principle to prepare a novel photon sieve which is different from the traditional photon sieve, and the positions of the photon sieve columns in the new photon sieve correspond to the positions of the small holes of the traditional photon sieve. Although the physical structure of the photon sieve produced by the present invention is not the same as that of ...

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Abstract

The invention discloses a large height-width ratio photon sieve and a preparation method thereof. The large height-width ratio photon sieve comprises a substrate and a photon sieve column, wherein the substrate comprises a photon sieve region and an edge region; the edge region is nontransparent for light with a preset wavelength; besides the region in which the photon sieve column is positioned, the photon sieve region is transparent for the light with the preset wavelength; and the photon sieve column is approximately of a cylinder shape, is positioned at the position in the photon sieve region, which corresponds to a fresnel zone plate bright ring, and is nontransparent for the light with the preset wavelength. According to the invention, the height-width ratio can be controlled under high efficiency, so that the phase or amplitude photon sieve can be better manufactured.

Description

technical field [0001] The invention belongs to the technical fields of microelectronics and optics, and in particular relates to a photon sieve with a large aspect ratio and a preparation method thereof. Background technique [0002] In the field of high-energy rays, only when the thickness of the absorber reaches a certain value can the corresponding rays be absorbed, so it is of great significance to prepare a diffractive optical element with a large aspect ratio. In general, a structure with an aspect ratio greater than 4 can be called a high aspect ratio structure device. Fresnel zone plate is a basic diffractive optical element, figure 1 It is a structural schematic diagram of a Fresnel zone plate in the prior art of the present invention. The photon sieve is a new type of diffractive optical element based on the Fresnel zone plate. It replaces the area corresponding to the bright ring on the Fresnel zone plate with a large number of randomly distributed light-trans...

Claims

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Application Information

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IPC IPC(8): G02B5/18G03F7/00
Inventor 谢常青辛将朱效立潘一鸣刘明
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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