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A novel composite nano-visible light catalyst and its preparation method

A visible light and catalyst technology, applied in molecular sieve catalysts, chemical instruments and methods, physical/chemical process catalysts, etc., can solve the problems of low light conversion rate, easy poisoning failure, insufficient light response, etc.

Inactive Publication Date: 2011-11-30
上海图和环保材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the currently developed semiconductor materials generally have various disadvantages: low light conversion rate, can only use ultraviolet light in sunlight; insufficient response to light, easy to poison and fail; difficult to regenerate, difficult to separate after entering water, etc.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0013] Example 1: Mix cetyltrimethylammonium bromide, tetraethyl orthosilicate, sodium hydroxide, and deionized water in a ratio of 1:6:1:500 to synthesize MCM-41 by hydrothermal method Synthesis: Dissolve 8.4g MCM-4, 5.0g copper sulfate pentahydrate, 50ml oleic acid and 5g polyethylene glycol 2000 in 1000ml water, add, stir to dissolve, and heat up to 30°C. Slowly add 25ml of hydrazine hydrate solution, stir the reaction, the color of the solution gradually becomes darker, and stop heating after 20 minutes. The cooled solution is left to stand and then centrifuged, washed with deionized water, ethanol and acetone repeatedly for more than three times, and vacuum-dried to obtain the mesoporous material coated with nano-cuprous oxide.

example 2

[0014] Example 2: Mix cetyltrimethylammonium bromide, tetraethylorthosilicate, sodium hydroxide, and deionized water in a ratio of 1:6.5:1.2:500 to synthesize MCM-41 by hydrothermal method Synthesis: Dissolve 9.2g MCM-4, 2.5 cupric sulfate, 6g dodecyltrimethylammonium chloride and 5g hexadecane in 100ml ethanol, stir to dissolve, and heat up to 30°C. Slowly add 0.37g of sodium borohydride and stir the reaction, and the subsequent operations are the same as in Example 1.

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PUM

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Abstract

The invention discloses a novel composite nanometer visible light catalyst and a preparation method thereof, belonging to the field of fine chemical industry. The main components are: 5-20wt% of nano cuprous oxide, 80-95wt% of carrier molecular sieve. The method is a mesoporous material coated with nano-cuprous oxide on the surface prepared by an in-situ reduction method, and can effectively utilize visible light to treat printing and dyeing sewage. The invention has the advantages of simple process, convenient operation, mild reaction, short reaction time and high efficiency; the particle size of the nano-cuprous oxide is small, and the particle size of the nano-composite catalyst is large, which is beneficial to the separation of the treatment agent and the treatment liquid; the preparation cost is low, and the energy Low consumption, no harmful waste, in line with the modern production requirements of "green production, environmental protection and energy saving".

Description

Technical field [0001] The invention discloses a novel composite nano-visible light catalyst and a preparation method thereof, belonging to the field of fine chemical industry, and in particular relates to a nano-composite catalyst with good dispersion, nano-cuprous oxide plated on the surface of a mesoporous material, and visible light response. Background technique [0002] Photocatalytic technology is widely regarded as an ideal environmental pollution control technology for sewage treatment. A number of photocatalytic processes in semiconductors can use sunlight to catalyze the decomposition of organic pollutants into inorganic products such as carbon dioxide, without secondary pollution. The key to preparing semiconductor photocatalysts is how to effectively improve the utilization rate of sunlight, how to improve the cost performance of photocatalysts, and how to separate catalysts and water well. However, the currently developed semiconductor materials generally have...

Claims

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Application Information

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IPC IPC(8): B01J29/76C02F1/30
CPCY02W10/37
Inventor 余晓锦
Owner 上海图和环保材料科技有限公司
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