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Balancing mass system and workbench

A technology of balancing quality and workpiece table, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems that are not conducive to simplifying the control process and cost control, many motors, and complex control algorithms.

Active Publication Date: 2011-05-25
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The technical solution of this patent uses more motors, and the control algorithm is complicated, which is not conducive to simplifying the control process and cost control

Method used

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  • Balancing mass system and workbench
  • Balancing mass system and workbench
  • Balancing mass system and workbench

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Embodiment Construction

[0033] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.

[0034] figure 1 Shown is a schematic top view of the workpiece table structure with shock absorbing device in the first embodiment of the present invention; figure 2 shown as figure 1 Schematic diagram of the front view of the middle workpiece table structure; image 3 shown as figure 1 Schematic diagram of the left view of the middle workpiece table structure. Please also refer to Figure 1 ~ Figure 3 .

[0035] According to the functional modules, the work table with shock absorbing device in this embodiment can be divided into: base 11, actuation system and balance mass system.

[0036] The base 11 is placed on a stable platform, which itself has a certain leveling ability, and is used to stably support the entire workpiece platform.

[0037] The actuation system includes a fine movement...

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Abstract

The invention discloses a workbench with a balancing mass system, which comprises a base, a micropositioner, a macro platform and the balancing mass system, wherein the macro platform comprises two Y-direction long-stoke motors and two Y-direction long-stroke sliding blocks driven by the two Y-direction long-stroke motors; the balancing mass system comprises lower-layer balance weights and four upper-layer balance weights which are connected in an air flotation way; the lower-layer balance weights are in vertical air floatation connection with the base, and are provided with two Y-direction air flotation guide rails and two Y-direction guide rails; two Y-direction long-stroke sliding blocks are arranged on the two Y-direction guide rails in a sliding way; the end parts of the four upper-layer balance weights are connected end to end by a plurality of flexible hinges to form a mouth shape, are arranged on the two Y-direction air flotation guide rails and are provided with two Y-direction motor stator guide rails; and rotors of the two Y-direction long-stroke motors are arranged on the two Y-direction motor stator guide rails in the sliding way. The workbench provided by the invention can eliminate or reduce negative influence on the micropositioner in an Rz direction.

Description

technical field [0001] The invention relates to a workpiece platform of a photolithography device, and in particular to a workpiece platform of a photolithography device with a balance mass system. Background technique [0002] In the H-type bilateral drive workpiece table system of the lithography machine, the workpiece table generally includes a fine motion table and a coarse motion table. Negative effects such as vibration of the platform. The workpiece table carries workpieces such as silicon wafers to be photoetched. Due to the high precision requirements in the photolithography process, eliminating the vibration of the workpiece table plays an important role in controlling the photolithography accuracy. Since the early micro-motion table did not have high requirements for the planar motion speed of the coarse motion table, the reaction force generated by the coarse motion was introduced to the frame of the whole machine, and the resulting negative effect was compensat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 郑乐平吴立伟庞璐方敏
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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