Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Applicant patent ranking analysis system and method

A patented analysis and analysis system technology, applied in special data processing applications, instruments, electrical digital data processing, etc., can solve the problem of the accuracy of analysis results cannot be guaranteed, and achieve the effect of improving efficiency

Inactive Publication Date: 2011-03-23
J Z M C INTPROP DATA SCI & TECH
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, there is no effective and fast software for the analysis of the overall ranking of applicants in the market, especially for a group of applicants under different technical classification conditions. There is no flexible and fast method for ranking analysis. human and material resources, and the accuracy of the analysis results cannot be guaranteed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Applicant patent ranking analysis system and method
  • Applicant patent ranking analysis system and method
  • Applicant patent ranking analysis system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] Such as figure 1 The overall frame diagram of the analysis system is shown. The system includes a patent database, and also includes a patent topic building module that collects the required analysis data from the patent database to establish a patent analysis topic database, connects with the patent analysis topic database, collects information from the patent analysis topic database, and ranks the number of applicants' patents A ranking analysis module and a display module connected with the ranking analysis module and displaying the ranking analysis results, the display module is provided with a chart display unit and a display control unit.

[0018] The ranking analysis module described in the applicant patent total ranking analysis system is connected with a ranking applicant quantity selection module. The display control unit includes a graphic shape control subunit, a graphic color control subunit, a patent number display control subunit, a font control subunit,...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an applicant patent ranking analysis system and an applicant patent ranking analysis method. The system comprises a patent database, a patent subject establishment module, an applicant patent number ranking analysis module and a display module for displaying a ranking analysis result. The analysis method comprises the following steps of: 1) establishing the patent database by retrieving patent bibliographic databases of various countries according to a preset technical scheme; 2) retrieving patents in the patent database by adopting the patent subject establishment module; 3) processing information in a patent analysis subject library by adopting the ranking analysis module to acquire applicant patent number ranking information; and 4) displaying an applicant patent number ranking information map through a graph display unit in the display module, and controlling the display contents of the applicant patent number ranking information map by using a display control unit. The applicant ranking condition is intuitively and quickly reflected in a graphic form.

Description

technical field [0001] The invention relates to a patent information processing system and method, in particular to an analysis system and analysis method for the total ranking of applicants' patents. Background technique [0002] With the rapid development of science and technology and the increasingly fierce competition among enterprises, analyzing, researching and utilizing patent information has become one of the important means for enterprises to benefit from competition and maintain a favorable competitive position. The analysis of patent information can help enterprises understand the number of patent applications of the industry and competitors in a certain period of time, and the ranking in this field, so as to understand the distribution of technical patents in this field and the situation of patent monopoly. [0003] At present, there is no effective and fast software for the analysis of the overall ranking of applicants in the market, especially for a group of ap...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06F17/30
Inventor 唐向东魏国柱
Owner J Z M C INTPROP DATA SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products