Biological protection composite for lowering electromagnetic radiation damage and preparation method
A composition and technology of the composition, applied in the field of biological protection composition and preparation for reducing electromagnetic radiation damage, can solve the problems of insufficient attention to anti-electromagnetic radiation and few reports, so as to improve the effect of anti-radiation, regulate cell growth, The effect of protecting against electromagnetic radiation damage
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0030] The extraction of tea polyphenols, ganoderma polysaccharides, spirulina polysaccharides and ginkgo flavonoids (described tea polyphenols, ganoderma polysaccharides, spirulina polysaccharides and ginkgo flavonoids can also be purchased directly from the market) in the following examples is as follows:
[0031] 1. Extraction of tea polyphenols:
[0032] Use wild tea or artificially cultivated tea (green tea, oolong tea, black tea) leaves and branches as raw materials, add 4-8 times the mass ratio of hot water (temperature is about 60 ℃) to soak and extract the raw materials twice, each time 1.5-2 hours, cooled or naturally precipitated at 4-6°C for 12-48 hours, filtered or precipitated with whole alcohol; when the filtrate was concentrated to 1 / 2 volume, it was quickly dried in vacuum or spray-dried to a water content of no more than 6wt%. crude t...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com