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Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display

A technology of photosensitive resin and photosensitive resin layer, which is applied in the field of photosensitive resin composition and photosensitive transfer material, can solve the problems of deterioration of coating film formation, difficulty in uniform coating, difficulty in obtaining uniform film, etc., and achieve suppress splash effect

Inactive Publication Date: 2012-06-13
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, there is a problem that not only the ink repellency is insufficient in conventionally known fluorine-based materials such as fluorine-containing compounds, but also that the resin layer containing fluorine-containing raw materials such as fluorine-containing compounds is provided on the photosensitive layer on the temporary support. In the case of the lower layer, when the photosensitive layer is formed on the resin layer, the coating liquid for forming the photosensitive layer is splashed, and it is difficult to obtain a uniform film, and it is difficult to perform uniform coating, and the formation of the coating film is deteriorated

Method used

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  • Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display
  • Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display
  • Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0147] It can be synthesized through the two steps shown below.

[0148] : Synthesis of resin A1

[0149] Under a nitrogen flow, 15 g of methyl ethyl ketone (MEK) was added to a 300 ml three-neck flask provided with a cooling tube, and heated to 70° C. under a water bath. 12.5 g of 2-(perfluorooctyl)-ethyl acrylate (FAAC8, produced by Unimatec (Unimatec) Co., Ltd.) dissolved in 20 g of MEK was added dropwise thereto with a plunger pump for 2 hours, respectively. 0.024mol) and polyethylene oxide monomer (PE350, NOF Co., Ltd.) 12.5g (0.029mol) solution and 2,2'-azobis(isobutyric acid) bis A solution of 0.131 g (0.001 mol) of methyl ester (V601, manufactured by Wako Pure Chemical Industries, Ltd.). After completion of the dropwise addition, the mixture was stirred for 5 hours.

[0150] Through the above operations, 2-(perfluorooctyl)-ethyl acrylate (FAAC8) and polyethylene oxide monomer (PE350) were copolymerized to synthesize resin A1 with FAAC8 / PE350=50 / 50 (mass ratio).

[...

Synthetic example 2

[0157] It can be synthesized through the two steps shown below.

[0158] : Synthesis of Resin B1

[0159] Under a nitrogen flow, 15 g of methyl ethyl ketone (MEK) was added to a 300 ml three-neck flask provided with a cooling tube, and heated to 70° C. under a water bath. 12.5 g of 2-(perfluorooctyl)-ethyl acrylate (FAAC8, produced by Unimatec (Unimatec) Co., Ltd.) dissolved in 20 g of MEK was added dropwise thereto with a plunger pump for 2 hours, respectively. 0.024mol) and polyethylene oxide monomer (PE350, NOF Co., Ltd.) 12.5g (0.029mol) solution and 2,2'-azobis(isobutyric acid) bis A solution of 0.131 g (0.001 mol) of methyl ester (V601, manufactured by Wako Pure Chemical Industries, Ltd.). After completion of the dropwise addition, the mixture was stirred for 5 hours.

[0160] Through the above operations, 2-(perfluorooctyl)-ethyl acrylate (FAAC8) and polyethylene oxide monomer (PE350) were copolymerized to synthesize resin B1 with FAAC8 / PE350=50 / 50 (mass ratio).

[...

Synthetic example 3

[0167] It can be synthesized through the two steps shown below.

[0168] : Synthesis of resin C1

[0169] Under a nitrogen flow, 15 g of methyl ethyl ketone (MEK) was added to a 300 ml three-neck flask provided with a cooling tube, and heated to 70° C. under a water bath. 18.8 g of 2-(perfluorooctyl)-ethyl acrylate (FAAC8, produced by Unimatec (Unimatec) Co., Ltd.) dissolved in 20 g of MEK was added dropwise thereto with a plunger pump for 2 hours, respectively. 0.036mol) and polyethylene oxide monomer (PE350, NOF Co., Ltd.) 6.3g (0.015mol) solution and 2,2'-azobis(isobutyric acid) bis A solution of 0.118 g (0.001 mol) of methyl ester (V601, manufactured by Wako Pure Chemical Industries, Ltd.). After completion of the dropwise addition, the mixture was stirred for 5 hours.

[0170] Through the above operations, 2-(perfluorooctyl)-ethyl acrylate (FAAC8) and polyethylene oxide monomer (PE350) were copolymerized to synthesize resin C1 having FAAC8 / PE350=75 / 25 (mass ratio).

...

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Abstract

Disclosed is a photosensitive resin composition containing at least a resin represented by the following structural formula (1), or [R<1>-R<5>: H or an alkyl group having 1-5 carbon atoms in total; L<1>-L<3>: a divalent linking group; X<1>: an ester group, an amide group or an arylene group; X<2>: an ether group, an ester group, an amide group, an arylene group or a heterocyclic residue; Rf a substituent containing fluorine; n = 2-20, a = 0-40, b = 1-40, c = 20-98 (mass ratio)].

Description

technical field [0001] The present invention relates to a photosensitive resin composition suitable for manufacturing display elements such as color filters, a photosensitive transfer material, a partition using the photosensitive transfer material, a method for forming the same, an optical element, and a method for manufacturing the same , LCD monitors, LCD color TVs and other display devices. Background technique [0002] In recent years, the demand for liquid crystal displays for personal computers, liquid crystal color televisions, and the like tends to increase. In addition, there are increasing demands for improvement in characteristics and cost reduction of color filters that are indispensable for constituting these displays. [0003] Conventionally, as a method for producing a color filter, a dyeing method, a pigment dispersion method, an electrodeposition method, a printing method, and the like have been proposed. [0004] For example, the dyeing method forms a la...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/038C08F220/24C08F220/36G02B5/20G03F7/004G03F7/11G03F7/20G03F7/40
CPCC08F220/06G03F7/033C08F220/40G02B5/20C08F220/18G03F7/0046C08F220/1807G03F7/0382G03F7/11
Inventor 有冈大辅安藤豪佐佐木广树
Owner FUJIFILM CORP
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