Mask holding mechanism and film forming apparatus

A technology of holding mechanism and film forming device, which is applied in lighting devices, optomechanical equipment, ion implantation plating, etc., and can solve problems such as position deviation and inability to form patterns

Inactive Publication Date: 2010-05-19
MITSUI ENG & SHIPBUILDING CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, when performing alignment, a certain amount of gap (distance that will not be affected by magnetic force) must be left between the mask and the glass substrate. After the alignment is completed, if the mask is brought close to the glass substrate, then as above As mentioned above, since the mask covers the glass substrate sequentially from the center part to the peripheral part, positional deviation occurs between the mask and the glass substrate, and the correct pattern cannot be formed on the glass substrate.

Method used

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  • Mask holding mechanism and film forming apparatus
  • Mask holding mechanism and film forming apparatus
  • Mask holding mechanism and film forming apparatus

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Embodiment Construction

[0034] Preferred embodiments of the mask holding mechanism and film forming apparatus according to the present invention will be described below. In addition, in this embodiment, a vacuum vapor deposition device is used as a film forming device, and a mode of manufacturing an organic EL element using this vacuum vapor deposition device will be described.

[0035] figure 1 It is an explanatory drawing of the vacuum evaporation apparatus concerning an Example. figure 2 It is a figure for explaining the arrangement|positioning of the magnet of the Example which was provided in the chuck|zipper. In these figures, the vacuum evaporation apparatus 10 is equipped with an evaporation source 12 (sublimation source) of an organic material 11 at its bottom, and is equipped with a chuck 14, a magnet 16, a substrate holder 18, and a mask holder at its upper portion. Holder 20.

[0036] The evaporation source 12 of the organic material 11 includes a crucible 12 a into which the organic...

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Abstract

A mask holding mechanism is provided for a mask (24) which covers a substrate mounted and held on a chuck (14) of a film forming apparatus. The mask (24) is formed of a magnetic material, and an opposite side of the chuck (14) to the chuck plane which holds the substrate is dotted with magnets (16). The magnets (16) may be arranged at lattice points forming a lattice.

Description

technical field [0001] The present invention relates to a mask holding mechanism and a film forming device. Background technique [0002] In a vacuum evaporation device for manufacturing organic electroluminescence (EL, Electroluminescence) elements, an evaporation source (sublimation source) for heating and evaporating (sublimating) organic materials is provided at the bottom. In addition, the vacuum evaporation apparatus includes a chuck disposed opposite to the evaporation source to support the glass substrate, and a magnet disposed above the chuck to support a mask for covering the surface of the substrate. Chucks are flat plates used to hold glass substrates on a flat surface. In addition, in the vacuum deposition apparatus, a mask for forming a pattern of an organic EL element on a glass substrate is configured to be disposed between a chuck (glass substrate) and a crucible. Also, the mask is formed of a magnetic body. [0003] In this vacuum deposition apparatus, w...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24C23C14/04C23C14/12C23C14/50C23C14/56H01L51/50H05B33/10
CPCG03F7/707C23C14/042C23C14/04C23C14/24H05B33/10
Inventor 片冈达哉长尾兼次齐藤谦一
Owner MITSUI ENG & SHIPBUILDING CO LTD
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