Translucent applique cutwork machine embroidery and method

Abstract

Translucent applique cutwork embroidery designs can be performed by a sewing machine, preferably a computerized machine with digitized design embroidery patterns. The method employs a foundation fabric 11 and a removable stabilizer 12. Once a cutwork section 14 in an applique cutwork embroidery design is defined with a set of concentric underlay stitches 13 that bind said foundation fabric to removable stabilizer, said foundation fabric is removed from said cutwork section. An applique fabric 16 is then stitched in place over the cutwork section with another set of concentric underlay stitches 13 that are sewn in approximately the same location as the first set of concentric underlay stitches. Excess applique fabric 16 is cut away. The applique cutwork seam 18 joining applique fabric to foundation fabric is finished with zigzag stitches 17 that overcast all said concentric underlay stitches. Where appropriate, a machine embroidery design 19 is stitched on top of said applique fabric, cascading onto said foundation fabric. Said applique cutwork seam is concealed with satin stitches, or similar concealing stitches 20. The balance of the embroidery design is stitched onto said foundation fabric. When said removable stabilizer is removed, no further trimming of fabrics or threads is required.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application claims the benefit of PPA Ser. No. 60 / 555,940, filed on 2004 Mar. 24 by the present inventor.BACKGROUND OF THE INVENTION [0002] This method relates to embroidery and more particularly to a method for performing applique cutwork embroidery with a sewing machine, which yields applique cutwork embroidery that looks like fine applique cutwork embroidery, performed by hand. [0003] Traditional cutwork embroidery is accomplished by removing whole sections of material from a fabric, before, during, or after the application of an embroidery design, leaving a void in said fabric that is integral to an embroidery design. Satin, or similar, stitches applied in tight formation about a section of fabric to be removed, hold in place threads of said fabric after fabric sections are removed. [0004] With the expansion of fabric types that include materials such as organza, organdy, netting, and laces, cutwork embroidery has expanded to i...

AI Technical Summary

Benefits of technology

[0015] The primary object of the present invention is to provide a method for producing applique cutwork embroidery using a sewing machine (preferably one that is computerized and has digitizing software) which duplicates the appearance of hand stitched applique cutwork embroidery;

[0016] Another object is to provide such a method that yields applique cutwork embroidery having an even more enhanced, perfectly stitched appearance than that of hand stitched applique cutwork embroidery;

[0017] An additional object is to provide such a method, which produces a seam construction suitable for using applique cutwork embroidery in everyday garments and other fabric products in which said products undergo normal, daily wear and stress;

Problems solved by technology

Also said method does not address applique cutwork seam construction suitable for normal, daily wear and stress.

In addition, said method does not address embroidery on the applique fabric.

Furthermore, said method calls for removal of excess applique fabric after all stitching is complete, limiting the scope of the overall applique cutwork embroidery on the foundation fabric and choice of fabric that may be used for applique.

However, said method does not allow for machine embroidery designs that span both foundation and applique fabric.

Furthermore, said method does not address applique cutwork seam construction suitable for normal, daily wear and stress.

This method leaves one side of the embroidery design unsuitable for display.

Furthermore, said method does not address applique cutwork seam construction suitable for normal, daily wear and stress.

However, methods do not apply to my invention.

However, methods do not apply to my invention.

However, the methods do not include embroidery or cutwork.

While some of the aforementioned methods produce applique cutwork embroidery designs with a sewing machine, the durability of the applique cutwork embroidery is such that items manufactured with these methods are relatively fragile products, requiring special handling and minimal use in order to preserve the applique cutwork embroidery design.

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