Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Superpower high-energy ultra-short laser pulse stretching device and its regulating method

A technology of ultrashort laser and pulse stretching, applied in the field of pulse stretching and improving the beam quality of ultrashort pulses, chirped pulse stretcher, can solve the difficulty of adjustment, mutual influence, and increase the difficulty of adjusting large aperture gratings in compressors and other issues, to achieve the effect of reducing adjustment difficulty, improving performance, and high contrast

Inactive Publication Date: 2007-02-07
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF0 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Its shortcomings are also obvious. Since the two stretchers are stacked, they affect each other when tuning the span ratio, and the two stretchers need to be synchronized at the same time. In this case, the tuning task of the dispersion compensation of this system is practical. The above is done in the compressor
This will inevitably increase the difficulty of adjusting the large-diameter grating in the compressor, especially at present, most of the large-diameter gratings need to be obtained by grating splicing, so its adjustment is more difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Superpower high-energy ultra-short laser pulse stretching device and its regulating method
  • Superpower high-energy ultra-short laser pulse stretching device and its regulating method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] figure 2 It is a schematic diagram of the high-power and high-energy ultrashort laser pulse stretching device of the present invention. It can be seen from the figure that the high-power and high-energy ultrashort laser pulse stretching device of the present invention is composed of a first stretcher 1 and a second stretcher 2. The first stretcher The second stretcher 2 is placed after the OPA pre-amplification, and has the function of continuously tuning the second-order and high-order dispersion:

[0029] The first stretcher 1 is made up of the first cylindrical concave reflector 11, the first cylindrical convex reflector 12, the first grating 13 and the first total reflection mirror 14; the first cylindrical concave reflector 11. The first cylindrical convex mirror 12, the first grating 13 and the first total reflection mirror 14 are respectively placed on the respective four-dimensional adjustment frames 31, 32, 33. The first cylindrical concave mirror 11, the firs...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
radiusaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a high-power high-energy ultra-short laser impulse expander and a relative adjusting method, wherein said device is formed by two expanders, while the first is after the seed laser, and the expand ratio is fixed, and the second expander is after the pre-expansion of OPA, to continuously adjust resonance on secondary, third and fourth chromatic aberrations. The invention is characterized in that: it can realize large expand ratio, and the laser impulse width is expanded from 50-200fs to 2-5ns; at the same time, since the continuous resonance adjustment of second expander, the adjustment hardness of large-scale grating of compressor can be reduced, and the adjustment is completed by the second expander, or not adjusting after the adjustment of compressor.

Description

technical field [0001] The invention relates to an ultra-strong ultra-short laser, which is a chirped pulse stretcher used in a high-power, high-energy ultra-short laser system, and is mainly suitable for high-energy (200-2000 joules) ultra-short (10 -15 ~10 -12 seconds) Super (10 12 ~10 15 Watts) pulse stretching for laser systems and improving beam quality for ultrashort pulses. Background technique [0002] Chirped Pulse Amplification (CPA for short) and Optical Parametric Chirped Pulse Amplification (OPCPA for short) are currently the classic methods for obtaining ultra-short and ultra-intense laser pulses, and have been widely used to build multiple terawatts (i.e. 10 12 W, abbreviated as TW) class laser system and petawatt (ie 10 15 W, abbreviated as PW) class laser system. It first uses a stretcher to introduce a certain amount of chirp to the femtosecond or sub-picosecond laser pulse to widen the pulse and inject it into a high-gain preamplifier. When the pulse...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/00H01S3/10G02F1/35
Inventor 杨庆伟郭爱林谢兴龙
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com