Service life predication method of rotation machine for apparatus for making semiconduictor and semiconductor-making apparatus thereof

Abstract

Provided is a lifetime estimation method of rotary machine for high sensitivity and stable semiconductor manufacturing device, which includes the following steps: measuring the acceleration of rotary machine to obtain the time series data (step S101); frequency-analyzing the time series data to obtain the spectrum (step S102); defining the frequency of the analyzed object (step S103); sampling to measure the reference time series data and the time series data for estimation of peak acceleration corresponding to the peak acceleration of the frequency of the analyzed object (step S104); using the reference time series data and the time series data for estimation to make the data for lifetime estimation of rotary machine to decide the lifetime of the rotary machine (step S105).

Description

technical field [0001] The present invention relates to a technology for predicting and diagnosing the lifetime of a rotary machine for semiconductor manufacturing equipment, particularly a diagnostic method for predicting the life of a rotary machine such as a vacuum pump, and to a semiconductor manufacturing apparatus including such a rotary machine. Background technique [0002] In recent years, in order to efficiently manufacture semiconductor devices, fault diagnosis techniques for semiconductor devices have become important. Especially in the system LSI, the tendency of low-volume high-variety production has become stronger, and a manufacturing method for these low-speed, high-efficiency semiconductor devices has also become necessary. [0003] Efficient production of semiconductor devices involves the use of multiple small-scale production lines. However, simply reducing the mass production line reduces the work efficiency of the manufacturing equipment. In addition...

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Problems solved by technology

Possibility of CVD growth in which pumps stop and a batch of manufactured product is bad

In addition, manufacturing equipment requires additional maintenance due to minute dust generated inside the CVD chamber, etc.

Implementation of additional maintenance significantly reduces the manufacturing efficiency of semiconductor equipment

On the other hand, in order to prevent sudden shutdown during the CVD growth process, the maintenance time of the pump must have a margin, and the maintenance frequency of the pump will increase.

This not only increases the maintenance cost, but also significantly reduces the operating efficiency of the LPCVD unit due to pump replacement

As a result, there is a disadvantage that the manufacturing efficiency of semiconductor devices is greatly reduced

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