Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Examination rating method, device and equipment based on project management and storage medium

A project management and psychological quality technology, applied in the field of equipment, project management-based test rating methods, equipment and storage media, and can solve problems such as the lack of a complete and effective evaluation system

Pending Publication Date: 2022-04-12
北京中企讯科技发展有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The embodiment of the present invention provides an examination rating method, device, equipment, and storage medium based on project management to solve the problem of lack of a complete and effective evaluation system in the prior art to provide reference for enterprises to screen personnel suitable for project declaration positions

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Examination rating method, device and equipment based on project management and storage medium
  • Examination rating method, device and equipment based on project management and storage medium
  • Examination rating method, device and equipment based on project management and storage medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] In order to make those skilled in the art better understand the solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only Embodiments are part of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0042] It should be noted that like numerals and letters refer to like items in the following figures, so once an item is defined in one figure, it does not require further definition and explanation in subsequent figures.

[0043] figure 1 Illustratively shows a schematic flow chart of an exam rating method based on a project management method ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an examination rating method, device and equipment based on project management and a storage medium, and the method comprises the steps: starting an examination rating function to rating a user after an examination rating authentication operation of the user is received; according to a preset objective question bank, performing an objective question test on the user to obtain an objective question rating score of the user; according to a preset subjective question bank, performing subjective question examination on the user to obtain a subjective question rating score of the user; and obtaining a comprehensive examination rating result of the user according to the objective question rating score and the subjective question rating score, and determining an examination grade of the user based on a preset examination rating rule. According to the invention, the examination rating mechanism is established for the project application post, and the examination grade of the job seeker can be objectively determined, so that an enterprise can objectively screen appropriate talents according to the examination grade of the job seeker, and reference can be provided for the enterprise to screen personnel suitable for the project application post.

Description

technical field [0001] The invention relates to the technical field of enterprise management, in particular to an examination rating method, device, equipment and storage medium based on project management. Background technique [0002] Many enterprises have set up relevant departments responsible for project application / honor qualifications, and set up project application positions / technical project management positions after realizing the boosting effect of national and local support policies on enterprise development. However, when companies recruit relevant personnel for project declaration, they cannot screen suitable talents according to the qualification certificates they hold like other consulting / service industries. [0003] At present, companies can only judge job seekers who apply for jobs by screening projects based on their experience and descriptions of job seekers, so as to enter or eliminate job applicants. The judgment of job seekers is relatively subjective...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06Q10/06G06Q10/10G06F16/435G06V40/16G06V20/40A61B5/16
Inventor 蒲兴国蒲凯云申云凡
Owner 北京中企讯科技发展有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com