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A kind of processing method of vapor deposition of base film for capacitor

A processing method and capacitor technology, which are applied in capacitors, capacitor manufacturing, vacuum evaporation coating, etc., can solve the problems of reducing the scope of application of processing methods, reducing flexibility, and not having a lifting and adjusting structure, so as to improve the cutting effect and improve Scope of application, effect of avoiding tilt

Active Publication Date: 2022-02-18
安徽源光电器有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The existing processing method of base film evaporation for capacitors has certain disadvantages in the process of use. The traditional processing method of base film evaporation for capacitors does not have a lifting adjustment structure. When the user uses the traditional processing method to pull the base film During the stretching and cutting operation, the cutting operation of multiple base films cannot be completed at one time, thereby reducing the scope of application of this processing method in the base film cutting operation; This reduces the flexibility of the traditional processing method of base film evaporation for capacitors when cutting materials, and brings certain adverse effects to users.

Method used

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  • A kind of processing method of vapor deposition of base film for capacitor
  • A kind of processing method of vapor deposition of base film for capacitor
  • A kind of processing method of vapor deposition of base film for capacitor

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Embodiment Construction

[0025] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention. Apparently, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0026] Such as Figure 1-4 Shown, a kind of processing method of base film vapor deposition for capacitor, the concrete steps of this method comprise:

[0027] Step 1, the base film raw material is sleeved on the first roller bar 3 of the film pulling device, and at the same time, one end of the base film raw material is passed through the film inlet groove on the box shell 2, and the base film raw material is stretched by the film pulling device, The stretched base film raw mate...

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Abstract

The invention discloses a method for processing base film vapor deposition for capacitors. The base film raw material is sleeved on the first roller bar of a film pulling device, and at the same time, one end of the base film raw material is passed through a film inlet groove on the casing of a box body. Use the film pulling device to stretch the base film raw material, so that the stretched base film raw material is discharged from the outlet groove of the box shell, and at the same time rotate the fastening latch between the first leg, the second leg and the cutting board, Loosen between the first leg, the second leg and the cutting board, cooperate with the longitudinal chute of the first leg and the second leg, and adjust the cutting board between the first leg and the second leg Position; the present invention is a method for processing base film evaporation for capacitors, so that the processing method can complete the cutting operation of multiple base films at one time during the base film processing process, while avoiding the inclination of the base film during the cutting process Phenomenon, improve the use effect of the processing method.

Description

technical field [0001] The invention belongs to the technical field of base film processing, and more specifically relates to a base film evaporation processing method for capacitors. Background technique [0002] The base film evaporation processing method for capacitors is a base film processing method that performs metal coating operations on capacitor base films through stretching and adsorption methods. Two conductors that are close to each other are sandwiched by a non-conductive layer. The insulating medium that constitutes the capacitor. [0003] The reference document CN108538582A discloses an improved metallized safety film, including a base film, a thickened coating strip evaporated on the evaporation surface of the base film, a grid-shaped safety film area electrically connected to the thickened coating strip, and The blank edge band on the other side of the safety film area; the safety film area includes coating units arranged in a matrix, vertical and horizont...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01G13/00C23C14/02
CPCH01G13/00C23C14/02
Inventor 温海波温城汉梅丽玲章新宇肖娟薛泽峰
Owner 安徽源光电器有限公司
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