Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

VR-SCIT intervention technology based on HRTF algorithm and VR interaction

A technology of VR-SCIT and intervention technology, applied in the field of schizophrenia treatment and rehabilitation, to achieve fast reproduction speed, weaken expert dependence, and improve masterable effects

Pending Publication Date: 2020-10-13
杭州市第七人民医院
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing SCIT technology is an expert-dependent rehabilitation technology, which needs to be carried out under the guidance of trained professional psychotherapists. Therefore, the existing SCIT model is difficult to promote on a large scale in the community

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • VR-SCIT intervention technology based on HRTF algorithm and VR interaction
  • VR-SCIT intervention technology based on HRTF algorithm and VR interaction
  • VR-SCIT intervention technology based on HRTF algorithm and VR interaction

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0029] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inside", "Outside", "Clockwise", "Counterclockwise", etc. or The positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of schizophrenia treatment and rehabilitation, in particular to a VR-SCIT intervention technology based on an HRTF algorithm and VR interaction. The VR-SCIT intervention technology consists of four parts, namely VR interaction, SCIT technology, VR video and VR sound effect. The VR interaction and SCIT technology are combined into the technical base of the VR-SCIT intervention technology, and the VR video and VR sound effects are combined into the content base of the VR-SCIT intervention technology. According to the invention, the VR technology and the SCIT technology are combined to realize VR-SCIT, thus reducing the expert dependence of the SCIT technology, improving the technical upper limit of the SCIT technology as well as the therapeutic effect and reducing its use cost.

Description

technical field [0001] The invention relates to the technical field of schizophrenia treatment and rehabilitation, in particular to a VR-SCIT intervention technology based on HRTF algorithm and VR interaction. Background technique [0002] Schizophrenia is a group of severe mental disorders with high relapse rate and high disability rate. Less than 14% of schizophrenia will not relapse after the first attack, and only 16% of schizophrenia can truly recover in their lifetime. %. There are about 10 million schizophrenic patients in our country at present. While schizophrenia brings great psychological burden to the patients themselves and their families, it also brings a huge social and economic burden to our country. However, the etiology of schizophrenia is not clear today, and it is still difficult to talk about cure in clinical treatment. Therefore, under the existing medical conditions, the targeted development of relevant mental rehabilitation technology is a reality th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G16H20/70G10L25/66A61B5/00
CPCG16H20/70G10L25/66A61B5/4088A61B5/4094
Inventor 沈志华汪永光
Owner 杭州市第七人民医院
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products