Semiconductor device and formation method thereof
A semiconductor and device technology, applied in the field of semiconductor devices and their formation, can solve problems such as poor performance of semiconductor devices, and achieve the effect of improving performance and avoiding damage
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[0034] As mentioned in the background, semiconductor devices formed in the prior art have poor performance.
[0035] Figure 1 to Figure 2 It is a structural schematic diagram of the formation process of a semiconductor device.
[0036] refer to figure 1 , providing the substrate 100; forming a gate structure 120, a spacer 130 and a dielectric layer 140, the gate structure 120 is located on the substrate 100, the spacer 130 is located on the sidewall of the gate structure 120, and the dielectric layer 140 is located on the substrate 100 around the gate structure 120 and the spacer 130 .
[0037] The gate structure 120 includes a gate dielectric layer 121 on the surface of the substrate 100 and a gate electrode layer 122 on the gate dielectric layer 121 .
[0038] refer to figure 2 , Form plugs 150 in the dielectric layer 140 on both sides of the gate structure 120 and spacer 130; after forming the plug 150, etch and remove the spacer 130 (refer to figure 1 ), a gap 160 ...
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