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Device and method for measuring outgassing rate of materials with double test chambers

A technology of testing room and outgassing rate, applied in the direction of analyzing materials, instruments, etc., can solve problems such as errors in testing devices and testing methods, and achieve the effects of reducing errors, eliminating errors, and avoiding disturbances

Active Publication Date: 2022-05-10
CHINA SPALLATION NEUTRON SOURCE SCI CENT +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] This application provides a device and method for measuring the outgassing rate of materials in a double test chamber, which is used to solve the problem of errors introduced by existing test devices and test methods

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  • Device and method for measuring outgassing rate of materials with double test chambers
  • Device and method for measuring outgassing rate of materials with double test chambers
  • Device and method for measuring outgassing rate of materials with double test chambers

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Embodiment Construction

[0048] The present application will be further described in detail below in conjunction with the accompanying drawings through specific embodiments, wherein similar components in different embodiments use associated similar component numbers. In the following implementation manners, many details are described for better understanding of the present application. However, those skilled in the art can readily recognize that some of the features can be omitted in different situations, or can be replaced by other elements, materials, and methods. In some cases, some operations related to the application are not shown or described in the description, this is to avoid the core part of the application being overwhelmed by too many descriptions, and for those skilled in the art, it is necessary to describe these operations in detail Relevant operations are not necessary, and they can fully understand the relevant operations according to the description in the specification and general ...

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Abstract

The application discloses a device and method for measuring the outgassing rate of a material with a double test chamber, the device includes a high vacuum chamber, a first test chamber, a first valve, a second test chamber, a second valve, an ultra-high vacuum chamber, a rough Pumping unit, fine pump, first vacuum gauge, second vacuum gauge and third vacuum gauge. Due to the addition of the second vacuum gauge, when the first valve or the second valve is opened, the pressure in the first test chamber and the second test chamber can be measured at the same time, which eliminates the error caused by time and does not need to be converted during the actual measurement process The mechanical action of the gas circuit not only avoids the disturbance of the vacuum reading due to the opening and closing of the valve, but also improves the measurement efficiency.

Description

technical field [0001] The application relates to the field of vacuum measurement, in particular to a device and method for measuring the outgassing rate of materials with double test chambers. Background technique [0002] When using double test chambers to measure the outgassing rate of materials, it is necessary to set up two completely symmetrical test chambers (No. 1 test room and No. 2 test room). Both test rooms have valves, and the conversion of the gas passage can be realized by opening and closing the valves. . When performing measurement work, the first step is to open and only open the valve of the No. 1 test chamber, let the gas pass through the No. 1 test chamber, and test the pressure P1 of the No. 1 test chamber through a vacuum gauge. In the second step, open and only open the valve of No. 2 test chamber, and test the pressure P2 of No. 1 test chamber through a vacuum gauge. The third step is to subtract the pressure P1 and pressure P2 measured in the firs...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N7/14
CPCG01N7/14
Inventor 关玉慧董海义宋洪
Owner CHINA SPALLATION NEUTRON SOURCE SCI CENT
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