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Statistical Process Control Method for Zero Excessive Particle Count in Clean Room

A statistical process control and particle number technology, applied in the registration/indication manufacturing process, registration/indication quality control system, calculation, etc., can solve problems such as unsatisfactory results

Active Publication Date: 2021-09-10
XIDIAN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Under this explanation, some zero-inflated models have been proposed, such as ZIP, ZINB and GZIP models, but in the monitoring of zero excess particle number, the corresponding control charts of ZIP, ZINB and GZIP models are used for statistical process control not ideal

Method used

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  • Statistical Process Control Method for Zero Excessive Particle Count in Clean Room
  • Statistical Process Control Method for Zero Excessive Particle Count in Clean Room
  • Statistical Process Control Method for Zero Excessive Particle Count in Clean Room

Examples

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Embodiment Construction

[0053] The present invention will be further described below by taking the number of particles collected in a clean room of an integrated circuit manufacturing company as an example in conjunction with the accompanying drawings.

[0054] refer to figure 1 , the implementation steps of this example are as follows:

[0055] Step 1: Collect a sample.

[0056] Using a Lasair II-100 particle counter, in a clean room with a cleanliness of 100, the number of particles with a particle diameter greater than 0.5um is collected, and the data is collected once per minute. After collecting 250 samples continuously, 90 zero data are obtained, and the sample data are shown in Table 1.

[0057] Table 1 Sample data with zero excess particle count

[0058]

[0059]

[0060] Step 2: Obtain the sample data according to step (1), and obtain the sample probability p with the number of particles m m and the sample probability mean

[0061] 2a) Perform statistics on the sample data in Ta...

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Abstract

The invention discloses a statistical process control method for the number of zero and excessive particles in a super-clean room, which mainly solves the problem that the existing statistical process control technology has too many false alarms or cannot alarm in time when the proportion of zero particles in a super-clean room is greater than 50%. The problem. The implementation steps are: 1. Use the particle number counter to collect the number of particles in the air, and the collected data contains at least 90 non-zero data; 2. Obtain the probability of different particle numbers; 3. Use the iterative method to calculate the threshold poise The estimated values ​​of the parameters c and T in the loose distribution are used to obtain the upper control limit; 4. According to the drawing method of the Shewhart control chart, the particle number and the control line are drawn into the corresponding control chart; 6. By observing whether the control chart is A little beyond the upper control line to judge whether the number of particles in the clean room is under control, and whether to continue production, so as to realize timely early warning when the number of particles is out of control, improve product quality, and reduce economic losses caused by out of control. It can be used in semiconductor production. quality monitoring.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, and in particular relates to a statistical process control method, which can be used to monitor whether the number of particles in a clean room is in a controlled state when there are too many zeros. Background technique [0002] "Statistical Process Control" is one of the most popular and effective quality improvement methods today. Statistical process control technology mainly refers to the use of Shewhart's process control theory, that is, the control chart to monitor the various stages of the product in the production process, that is, the quality characteristics of the process, and analyze the trend of the quality characteristics according to the point distribution on the control chart. Preventive measures to ensure that the production process is in a state of statistical control, so as to achieve the purpose of improving and ensuring quality. [0003] In semiconductor manufacturing,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06Q10/06G07C3/00G07C3/14G06Q50/04
CPCG06Q10/06395G06Q50/04G07C3/005G07C3/146Y02P90/30
Inventor 游海龙张金力田文星贾新章顾铠
Owner XIDIAN UNIV
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