cleaning device

Abstract

The invention relates to a cleaning device which comprises a pair of cleaning structures. A V-shaped groove with a cavity in the middle is integrally formed by the pair of cleaning structures. The V-shaped groove is used for containing a gumming machine nozzle to be cleaned. The cleaning structures comprise wiping assemblies. Each wiping assembly comprises a rolling wiping structure and a liquid squeezing structure, wherein the rolling wiping structure is used for wiping the gumming machine nozzle when rolling and absorbing contact cleaning liquid for cleaning the gumming machine nozzle when wiping, and the liquid squeezing structure is close to the rolling wiping structure and used for squeezing out cleaning liquid absorbed by the rolling wiping structure in a squeezing way. By means of the arrangement of the cleaning device, when a liquid drainage pipe sprays out cleaning liquid, the wiping assemblies absorb cleaning liquid completely, the liquid squeezing structures squeeze out cleaning liquid absorbed by the rolling wiping structures in a squeezing way, cleaning liquid outside the gumming machine nozzle is prevented from entering the nozzle, cleaning liquid at the tip port of the nozzle is prevented from being left, and then influences produced on the film layer thickness in the gumming process are avoided.

Description

technical field [0001] The invention relates to the field of gluing, in particular to a cleaning device. Background technique [0002] In the imaging process of flat panel display, the coating of large-size glass substrates basically uses a linear coating machine to scrape and coat photoresist on the glass substrate. The required performance is: the uniformity of the film thickness is controlled within 3%. , There can be no bad phenomena such as uneven thickness of the film layer and lack of glue. However, after continuous coating for a period of time, dry photoresist will block the nozzle of the coating machine, resulting in poor uniformity of coating film thickness, and undesirable phenomena such as uneven film thickness. At this time, it is necessary to manually use a scraper to scrape and clean the nozzle. During the scraping and cleaning process, the photoresist and cleaning solution will penetrate into the glove and contact the skin, which will corrode the skin and af...

AI Technical Summary

Problems solved by technology

However, after continuous coating for a period of time, there will be a situation where the dry photoresist will block the nozzle of the coating machine, resulting in poor uniformity of coating film thickness and uneven film thickness.

At this time, it is necessary to manually use a scraper to scrape and clean the nozzle. During the scraping process, the photoresist and cleaning solution will penetrate into the glove and contact the skin, which will corrode the skin and affect human health.

In addition, during the gluing process, every time a certain amount of glass is gluing, the outside of the nozzle will be automatically purged according to the set program. The purging method is to spray the cleaning liquid on the entire nozzle tip port first, and then clean it after spraying it all. After cleaning, blow nitrogen to the nozzle tip port to dry the nozzle tip port. After blowing, the nozzle tip port will remain with cleaning liquid, which will affect the thickness of the film layer in the subsequent glue coating process.

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