Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Novel Dual-Passband Filter

A double-pass band filter, a new type of technology, is applied in the direction of waveguide devices, circuits, electrical components, etc., which can solve the problems of large volume, difficult design, and poor versatility of the double-pass band filter, and achieve compact and compact structure design. The effect of changing the center frequency and passband width and reducing the size

Active Publication Date: 2019-05-24
UNIV OF ELECTRONICS SCI & TECH OF CHINA
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a dual-passband filter with a simple structure, small size, high frequency selectivity, and good inter-band isolation for the problems of large volume, complex structure, difficult design, and poor versatility in the prior art. dual pass band filter

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Novel Dual-Passband Filter
  • A Novel Dual-Passband Filter
  • A Novel Dual-Passband Filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0043] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0044] Such as figure 1 , figure 2 As shown, the double-pass band filter in this embodiment includes a dielectric substrate 1 provided with a first ground via hole 11 and a second ground via hole 11', a main line 2 located on the upper surface of the dielectric substrate 1, and a dielectric substrate located on the dielectric substrate 1. Metal floor 3 on the lower surface of the substrate. The main line 2 is composed of a first second-order composite resonator 5 and a second second-order composite resonator 5' distributed axially symmetrically.

[0045] Such as Figure 5 As shown, the first s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a novel double-passband filter, which comprises a dielectric substrate provided with grounding through holes, a main line and a metal floor, the main line includes two symmetrically arranged second-order composite resonators, and each second-order composite resonator tor includes a ground via. Two symmetrically arranged second-order composite resonators are coupled through ground vias; the second-order composite resonator is a symmetrical structure, including an external second-order ladder impedance resonance unit and an internal second-order ladder impedance resonance unit, and two second-order ladder impedance resonance units The second-order ladder impedance resonance unit includes an external resonator and an internal resonator, and the external second-order ladder impedance resonance unit is provided with an open-circuit transmission line. The resonators can be electrically coupled, magnetically coupled, or cross-coupled. The dual passband filter realizes the miniaturization of the filter, and has the characteristics of center frequency, easy control of bandwidth, high frequency selectivity, good inter-band isolation, compact structure and small size.

Description

technical field [0001] The invention belongs to the technical field of microwave communication, and in particular relates to a novel double-passband filter. Background technique [0002] Today's spectrum resources are becoming increasingly tight. In order to improve spectrum utilization efficiency, increase information capacity and reduce interference between frequency bands, higher requirements are put forward for filter design. In addition to better out-of-band attenuation, farther out-of-band rejection, and better frequency selectivity, the rapid development of multi-passband communication has allowed multi-channel filters to be valued, and it has the advantage of high utilization of spectrum resources. At present, there are several ways to realize dual-passband filters: (1) A dual-band filter is formed by cascading two single-band filters, but it often needs to be accompanied by a matching network, which is not conducive to miniaturization; (2) In the The transmission z...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01P1/203
CPCH01P1/20381
Inventor 石玉胡越尉旭波吕洪光钟慧
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products