Growth rack for pothos cultivation equipment

The technology of cultivation equipment and growth rack, which is applied to the field of growth racks of green radish cultivation equipment, can solve the problems of affecting the continuous growth of radish, the limited length of support columns, etc., and achieve the effects of avoiding deflection, reliable support, and improving stability.

Inactive Publication Date: 2015-11-04
巫山天地农业开发有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] With the growth of the pothos planted in the pot, due to the limited length of the support column, the stems of the pothos grow upward beyond the top of the support column, and the support column cannot continue to support the stem of the pothos, which affects the continued growth of the pothos

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Growth rack for pothos cultivation equipment
  • Growth rack for pothos cultivation equipment
  • Growth rack for pothos cultivation equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] The specific embodiment of the present invention will be described in further detail by describing the embodiments below with reference to the accompanying drawings, the purpose is to help those skilled in the art to have a more complete, accurate and in-depth understanding of the concept and technical solutions of the present invention, and contribute to its implementation.

[0048] like figure 1 Shown is a kind of pothos cultivation equipment that adopts the growth frame of the present invention, including the cultivation container 2 for planting pothos and the growth frame that is used to provide support for the growth of pothos, such as Figure 1 to Figure 8As shown, the growth frame includes a vertical first support column 3 and a first cloth cover 1 sleeved on the first support column 3, the first support column 3 is a hollow circular tube, and the first support column 3 Insert the lower end in the cultivation container 2 and fix it. The cultivation container 2 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a growth frame of a scindapsus aureus cultivation device. The growth frame of the scindapsus aureus cultivation device comprises a first support pillar and a first cloth sleeve and further comprises a second support pillar, a third support pillar and an adjusting device, wherein the second support pillar is sleeved with the first cloth sleeve, and a flow guide structure for leading water to the first cloth sleeve is arranged on the first support pillar and the second support pillar. According to the growth frame, the second support pillar is additionally arranged, the length of the second support pillar can be increased, the third support pillar and the adjusting device capable of adjusting the height of the third support pillar are additionally arranged, the height of the third support pillar is adjusted through the adjusting device, the length adjustment range of the growth frame can be broadened, and with growing of the scindapsus aureus, stems of the scindapsus aureus can still climb on and be attached to the support pillars of the growth frame, so that continuous support can be provided for the scindapsus aureus. Through the arrangement of the flow guide structure on the first support pillar and the second support pillar, the flow guide structure leads the added water to the cloth sleeve position, the water permeates into the cloth sleeve conveniently and is fully absorbed by the cloth sleeve, so that the water can be absorbed by aerial roots on the stems of the scindapsus aureus, and the water is provided for the aerial roots conveniently.

Description

technical field [0001] The invention belongs to the technical field of plant cultivation, in particular, the invention relates to a growing frame of pothos cultivation equipment. Background technique [0002] Some plants in nature have soft stems that cannot stand upright, and need to be entwined or attached to others to grow upwards, so they are called climbing plants. [0003] Climbing plants, such as pothos, have strong stems that can be several meters long, and there are aerial roots at the stem nodes. With the growth of the age of the plant, the branches and leaves of the pothos are flourishing. [0004] Because the stems and vines of the pothos grow fast, people often do the column rattan cultivation, that is, erect a support column in the center of the flowerpot, and put a layer of cloth cover on the surface of the support column, so that the stem of the pothos can climb on the cloth cover. and grow upwards. [0005] With the growth of the pothos planted in the flo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): A01G9/12A01G27/04
Inventor 唐小华
Owner 巫山天地农业开发有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap