Computation efficiency by iterative spatial harmonics order truncation

A space harmonic and computationally efficient technology, applied in the field of optical metrology, which can solve the problems of missing information and the number of spatial harmonic orders cannot be arbitrarily minimized.

Inactive Publication Date: 2013-02-27
KLA TENCOR TECH CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the number of spatial harmonic orders cannot be minimized arbitrarily, as this may lead to loss of information

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  • Computation efficiency by iterative spatial harmonics order truncation
  • Computation efficiency by iterative spatial harmonics order truncation
  • Computation efficiency by iterative spatial harmonics order truncation

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Embodiment Construction

[0027] Methods for improving computational efficiency through optimized iterative order truncation are described here. In the following description, numerous specific details are set forth, such as certain iteratively determined truncated diffraction patterns, in order to provide a thorough understanding of embodiments of the invention. It will be apparent to those skilled in the art that the embodiments of the invention may be practiced without these specific details. In other instances, well-known processing steps, such as fabricating a stack of patterned material layers, have not been described in detail so as not to unnecessarily obscure the embodiments of the invention. Furthermore, it should be understood that the various embodiments shown in the drawings are illustrative representations and are not necessarily drawn to scale.

[0028] Methods for improving computational efficiency for diffraction signals in optical metrology are disclosed herein. A set of spatial harm...

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Abstract

A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of spatial harmonics orders for a grating structure. The set of spatial harmonics orders is truncated to provide a first truncated set of spatial harmonics orders based on a first pattern. The first truncated set of spatial harmonics orders is modified by an iterative process to provide a second truncated set of spatial harmonics orders based on a second pattern, the second pattern different from the first pattern. Finally, a simulated spectrum is provided based on the second truncated set of spatial harmonics orders.

Description

technical field [0001] Embodiments of the invention are in the field of optical metrology, and more particularly, relate to the selection of the number of spatial harmonic orders used in generating simulated diffraction signals for use in optical metrology measurements, processing, or simulations of grating structures . Background technique [0002] In the past few years, rigorous coupled wave analysis (RCWA) and similar algorithms have been widely used for the study and design of diffractive structures. In the RCWA method, the profile of a periodic structure is approximated by a given number of sufficiently thin planar grating slabs (slab). Specifically, RCWA involves three main steps, namely, the Fourier expansion of the electric and magnetic fields inside the grating, the calculation of the eigenvalues ​​and eigenvectors of the constant coefficient matrix that characterizes the diffraction signal, and the deduced from the boundary matching condition Solving linear syste...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G06F19/00
CPCG02B5/1847
Inventor A·维德曼J·J·亨奇
Owner KLA TENCOR TECH CORP
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