Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sample observation surface flattening device for microscope and sample flattening method

A sample observation and microscope technology, applied in microscopes, optics, instruments, etc., can solve the problems of sample observation effect, difficult sample observation surface, etc., so as to avoid the unclear mirror image of microscope observation, reduce the difficulty of preparation, and be easy to operate. Effect

Inactive Publication Date: 2014-03-12
ZHAOQING LEOCH BATTERY TECH
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of fixing the sample, artificially adjusting the observation surface of the sample makes it difficult to make the observation surface of the sample reach the standard level, which greatly affects the observation effect of the sample.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sample observation surface flattening device for microscope and sample flattening method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be described in detail below through specific embodiments and in conjunction with the accompanying drawings. The following examples are only to further illustrate the present invention, and should not be construed as a limitation of the present invention.

[0025] The microscope sample observation surface flattening device of the present invention, such as figure 1 As shown, it includes a seat body, a pressure plate 2 and a spring 7; wherein, the seat body includes a base 1 and a support rod 4, the support rod 4 has a lever arm 5, and the lever arm 5 extends horizontally from the support rod 4, parallel to the base 1, and It is located just above the base 1 ; the pressing plate 2 has a pressing rod 3 extending from its upper surface, and the extending end of the pressing rod 3 has a handle 6 . The lever arm 5 has an opening through which the pressing rod 3 is movably linked with the lever arm 5 , so that the pressing plate 2 can move linearly...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a sample observation surface flattening device for a microscope, which comprises a seat body and a pressing plate. The seat body comprises a base. The upper surface of the base is a flat plane. The lower surface of the pressing plate is also a flat plane and is always parallel to the upper surface of the base. The pressing plate is movably connected with the seat body, so that the pressing plate takes linear motion in a direction vertical to the upper surface of the base and the lower surface of the pressing plate is always kept parallel to the upper surface of the base. The invention also discloses a sample observation surface flattening method in which the device is employed. The sample observation surface flattening device for the microscope and the flattening method, which are disclosed by the invention, are simple and applicable to operate. An observation surface of a sample obtained by pressing has good levelness. The problem of unclear observing mirror image of the microscope, which is caused by the inclination, is avoided, and the observing effect of the microscope is greatly improved. Moreover, the samples with various sizes can be flexibly pressed according to the sizes of the samples so as to obtain the observation surfaces with good levelness. The sample observation surface flattening device for the microscope and the flattening method are suitable for any sample preparation treatment with high requirement on the levelness.

Description

technical field [0001] The invention relates to the field of processing equipment for samples used for microscope observation, in particular to a microscope sample observation surface flattening device and a sample observation surface flattening method. Background technique [0002] Stereo microscopes have a large depth of focus, a large diameter of the field of view and a long working distance, and can obtain a three-dimensional upright image, so they are widely used in the field of biomedicine, laboratories, and manufacturing and processing workshops, especially in small parts, More and more attention is paid to the observation / assembly / inspection of integrated circuits. Metal components, electronic components, instrument parts, etc. often have multi-angle irregular surface structures. For example, the upper and lower surfaces are uneven, which makes it unstable to place on the observation table of the stereo microscope or easily shakes slightly due to small external vibra...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B21/34
Inventor 熊正林路俊斗唐丽萍
Owner ZHAOQING LEOCH BATTERY TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products