Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Reducing foam formation

A foam, developer technology applied to the oxidation of developer liquid. field, which can solve problems such as reduced performance of plate development processing

Inactive Publication Date: 2012-02-01
EASTMAN KODAK CO
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above reactions lead to a reduction in the performance of the plate development process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Reducing foam formation
  • Reducing foam formation
  • Reducing foam formation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0008] The present invention describes a developer liquid circulation system in a printing plate developing system that significantly reduces the resulting foam formation during injection of developer liquid into a developer liquid container. The resulting foam accelerates the oxidation process of the developer liquid due to its inherently large surface area exposed to air.

[0009] Figure 1 shows a prior art developer circulation and injection system. figure 2 The essence or basic content of the improved developer circulation and injection system proposed by the present invention to reduce foam formation is shown. Injection pump 12 pumps developer liquid from developer source container 13 into developer liquid container 17 via main injection line 10 .

[0010] The main injection line 10 is split or separated into two line sections. The first pipeline segment 21 is used to flow the developer liquid into the circulation system 128 . The circulation system includes a develope...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An apparatus for reducing foam formation of a developer liquid (19) in a plate processor device includes: means for pumping the developer liquid (19) into a developer liquid reservoir (17); and means for splitting (21, 22) the flow of the developer liquid (19) into the developer liquid reservoir (17) by filling the liquid reservoir through a first reservoir opening (14) and through a second reservoir (27) opening in parallel.

Description

technical field [0001] The present invention relates to reducing foam formation and thereby reducing oxidation of developer liquids in plate processors used in the printing industry. Background technique [0002] During the injection of developer liquid into the developing tank of the plate developing device, infiltrating air often leads to foam formation of the developer liquid. The resulting foam, due to its large surface area, increases the contact of the developer liquid with the air in the system, thereby exacerbating the chemical oxidation of the developer liquid. The above reactions lead to a reduction in the performance of the plate development process. [0003] It is an object of the present invention to prevent, or at least substantially reduce, foam formation of a developer liquid in a printing plate developer for lithographic digital printing plates. Contents of the invention [0004] Briefly, according to one aspect of the present invention, there is provide...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/30G03D5/04
CPCG03F7/3085G03D3/06G03F7/3071Y10T137/0324
Inventor K·沙米尔M·玛罗姆
Owner EASTMAN KODAK CO
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products