Method for planting dry-land Brassica napus by using mulching film corn residual film
A corn field and rapeseed technology, applied in the field of no-tillage and drought-resistant planting of rapeseed, can solve the problems of poor ecological conditions of rapeseed, underdeveloped economy, insufficient labor input for rapeseed production, etc., and achieve uniform seedlings, good growth consistency, and increase in The effect of ventilation and light transmission
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[0021] Below in conjunction with embodiment, the present invention is further described.
[0022] This example was carried out in Huangshan Town, Yulong County, Lijiang City, Yunnan Province from 2010 to 2011. The altitude of this area is 2100 meters, and the effective rainfall during the growth period of rapeseed is 275 mm. The experimental site is a hillside land without irrigation conditions.
[0023] The experiment consisted of 3 treatments. Wherein, treatment 1 is the conventional cultivation method, treatment 2 is the method of the present invention, and treatment 3 is the full no-tillage method. All three treatments were repeated three times, and the detailed results are shown in Table 1 and Table 2.
[0024] The conventional cultivation method of treatment 1 mainly includes: after the corn is harvested, the residual film is removed, the soil is plowed and harrowed, and the soil is artificially ditched to level the moisture and make a pond. The row spacing is 30-45 cm ...
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