Cleaning process cavity and cleaning process for semiconductor silicon slice
A technology for process chambers and semiconductors, applied in liquid cleaning methods, semiconductor/solid-state device manufacturing, cleaning methods and appliances, etc., can solve the problems of low utilization rate of process chamber equipment, inoperable process chambers, and reduced equipment utilization. , to achieve the effect of improving equipment utilization, shortening cleaning time and saving time
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[0031] The cleaning process chamber for semiconductor silicon wafers and the cleaning process for semiconductor silicon wafers proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in very simplified form and use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.
[0032] Please refer to figure 1 , figure 1 Shown is a schematic top view structural diagram of a semiconductor silicon wafer cleaning process chamber according to a preferred embodiment of the present invention. The invention provides a cleaning process chamber for semiconductor silicon wafers. The process chamber has a rotatable multi-faceted cylinder 11 inside, and a cover ...
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